# US 10,319,568 B2 · Plasma processing apparatus for performing plasma process for target object

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 10,319,568 B2
- Document ID: US10319568B2
- Status: Granted
- Kind: B2
- Application number: 14/524,054
- Filed: 2014-10-27
- Published: 2015-05-14
- Granted: 2019-06-11
- Earliest claimed: 2013-11-12
- Assignees: Tokyo Electron Limited
- Applicants: Tokyo Electron Limited
- Inventors: Ippei Shimizu; Naoki Mihara; Shunsuke Ogata
- Web page: https://patentgrep.com/patent/US10319568B2

## CPC

- H01J 37/32651: {Shields, e.g. dark space shields, Faraday shields}
- C23C 16/4401: {Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber}
- H01J 37/32513: {Sealing means, e.g. sealing between different parts of the vessel}
- H01J 37/32743: {for introducing the material into processing chamber}
- H01J 37/32853: {Hygiene}
- F16K 3/00: Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing (F16K5/00 takes precedence; in barrages or weirs E02B8/04)
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- F16K: VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING {(devices for emptying and evacuating the excess liquid in valves or conduits F16L55/07)}

## Abstract

A plasma processing apparatus includes a process chamber including a sidewall, a mounting table disposed in the process chamber, a shield member which is disposed along the inner surface of the sidewall to surround the mounting table and has an opening facing the transfer port, and a shutter configured to open/close the opening, the shutter being movable up and down. The shutter has a first portion adapted to face the opening, and a second portion adapted to face the shield member at a lower side of the shield member. The shield member has a lower portion including a contact surface facing the second portion. A contactor adapted to contact the contact surface is disposed at the second portion. The first portion of the shutter closes the opening through a gap between the first portion and the shield member. The contact surface and the contactor are formed of HASTELLOY®.

## Claims

### Claim 1

A plasma processing apparatus for performing a plasma process for a target object, comprising:
a process chamber including a sidewall having a transfer port for loading and unloading the target object;
a mounting table disposed in the process chamber;
a shield member disposed along an inner surface of the sidewall to surround the mounting table, the shield member including an opening which faces the transfer port and a bottom portion which defines a bottom of the opening; and
a shutter which is movable up and down between an open position and a closed position, wherein in the closed position the shutter closes the opening, and
wherein:
the shutter includes:
(i) a first portion which faces the opening and closes the opening in the closed position, and
(ii) a second portion which faces a lower side of the bottom portion of the shield member, wherein the shutter includes a contactor having a nickel-based alloy surface, and the contactor is located at the second portion of the shutter,
the shield member further includes a nickel-based alloy contact surface which faces the second portion of the shutter,
the nickel-based alloy contact surface of the shield member and the nickel-based alloy surface of the contactor of the shutter contact each other when the shutter is in the closed position,
the first portion of the shutter includes a surface which is formed of a material which is different from the nickel-based alloy surface of the contactor,
wherein the shield member includes an aluminum portion and a nickel-based alloy portion provided below the aluminum portion at the lower side of the bottom portion of the shield member,
wherein the nickel-based alloy portion provides the nickel alloy contact surface of the shield member,
wherein the shutter includes a first groove on the second portion,
wherein the contactor is an elastic member fitted in the first groove and having a nickel-based alloy surface to provide the nickel-based alloy surface of the contactor of the shutter, and
wherein the aluminum portion includes a second groove and the nickel-based alloy portion comprises a block of nickel-based alloy material fitted into the second groove.

### Claim 2 (depends on 1)

The plasma processing apparatus of claim 1, wherein the nickel-based alloy elastic member is a spiral-shaped member.

### Claim 3 (depends on 1)

The plasma processing apparatus of claim 1, wherein the apparatus further includes a C-shaped member which is fastened to the upper portion of the first portion of the shutter by a screw, wherein the C-shaped member is formed of nickel-based alloy.

### Claim 4 (depends on 1)

The plasma processing apparatus of claim 1, wherein the shutter includes a thin portion and a thick portion, wherein the thin portion projects upward and circumferentially from a radial outer region of the thick portion.

### Claim 5 (depends on 1)

The plasma processing apparatus of claim 1, wherein the nickel-based alloy material restrains particles from being generated from the nickel-based alloy contact surface of the shield member and the nickel-based alloy surface of the contactor of the shutter by opening and closing of the shutter.

### Claim 6 (depends on 1)

The plasma processing apparatus of claim 1, wherein the contactor having the nickel-based alloy surface of the shutter is removably coupled to the first portion of the shutter, and wherein the first portion is formed of aluminum.