# US 10,313,569 B2 · Image measurement system and controller > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,313,569 B2 - Document ID: US10313569B2 - Status: Granted - Kind: B2 - Application number: 15/391,022 - Filed: 2016-12-27 - Published: 2017-09-07 - Granted: 2019-06-04 - Earliest claimed: 2016-03-07 - Assignees: OMRON Corporation - Applicants: Omron Corporation - Inventors: Gaku Shiramizu; Yuki Taniyasu; Naoya Ochi - Web page: https://patentgrep.com/patent/US10313569B2 ## CPC - H04N 23/56: provided with illuminating means - G01B 11/2504: {Calibration devices} - G01B 11/2513: {with several lines being projected in more than one direction, e.g. grids, patterns} - H04N 23/632: {for displaying or modifying preview images prior to image capturing, e.g. variety of image resolutions or capturing parameters} - H04N 23/69: Control of means for changing angle of the field of view, e.g. optical zoom objectives or electronic zooming - H04N: PICTORIAL COMMUNICATION, e.g. TELEVISION - G01B: MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ## Abstract An image measurement system includes a controller, a projector for emitting illumination light in accordance with a radiation pattern, an imaging unit, and a display unit. The controller includes a display control module for displaying on a display unit an image of a field of view captured by the imaging unit in a state in which illumination light is emitted, a receiving module for receiving a setting of a mask area in association with the image displayed on the display unit, the mask area being an area in which the quantity of illumination light should be reduced compared with another area in the field of view, and an updating module for updating the radiation pattern in accordance with the set mask area, based on a correspondence in position between the radiation pattern of the projector and a projection pattern produced in the field of view by the radiation pattern. ## Claims ### Claim 1 An image measurement system comprising: a controller comprising a processor and storage; a projector for emitting illumination light in accordance with a radiation pattern specified from the controller; an imager operative to capture an image and having a field of view in which an area irradiated with the illumination light exists; and a display adapted to display an image, wherein the controller is configured to display on the display an image of the field of view captured by the imager in a state in which the illumination light is emitted, receive a setting of a mask area in association with the image displayed on the display, the mask area being an area in which the quantity of illumination light is to be reduced compared with another area in the field of view, and update the radiation pattern in accordance with the set mask area, based on a correspondence in position between the radiation pattern of the projector and a projection pattern produced in the field of view by the radiation pattern, wherein the controller is further configured to extract an area having a pixel value matching a predetermined condition in the image of the field of view, as a candidate for mask area, and wherein the controller is further configured to determine the predetermined condition, based on each of images of the field of view captured in a state in which the quantity of illumination light emitted from the projector is varied into multiple levels. ### Claim 2 (depends on 1) The image measurement system according to claim 1, wherein the controller is configured to display a screen showing the set mask area, in addition to the image of the field of view, in association with a screen of the image of the field of view. ### Claim 3 (depends on 1) The image measurement system according to claim 1, wherein the controller is configured to display an image obtained by combining the set mask area with the image of the field of view, in addition to the image of the field of view. ### Claim 4 (depends on 2) The image measurement system according to claim 2, wherein the controller is configured to display an image obtained by combining the set mask area with the image of the field of view, in addition to the image of the field of view. ### Claim 5 (depends on 1) The image measurement system according to claim 1, wherein the controller is configured to selectively display the image of the field of view and an image obtained by combining the set mask area with the image of the field of view. ### Claim 6 (depends on 1) The image measurement system according to claim 1, wherein the controller is further configured to receive a setting of magnitude of the quantity of illumination light emitted from the projector. ### Claim 7 (depends on 1) The image measurement system according to claim 1, wherein the controller is configured to receive settings of a plurality of mask areas different from each other. ### Claim 8 (depends on 7) The image measurement system according to claim 7, wherein the controller is configured to receive a setting of magnitude of the quantity of illumination light emitted from the projector, separately for each of the plurality of mask areas. ### Claim 9 (depends on 1) The image measurement system according to claim 1, wherein the controller is configured to receive selection of a plurality of predefined shapes and receives specification of size and position of an area having the selected shape. ### Claim 10 (depends on 1) The image measurement system according to claim 1, wherein the controller is configured to receive an operation of changing a shape of the extracted candidate for mask area. ### Claim 11 (depends on 1) The image measurement system according to claim 1, wherein the controller is configured to receive a setting of a test area and sets an area except the test area in the field of view as a mask area, the test area being an area to be subjected to image measurement processing. ### Claim 12 (depends on 11) The image measurement system according to claim 11, wherein the controller is further configured to generate a composite image by combining images captured under a plurality of imaging conditions in a state in which illumination light is emitted in accordance with a radiation pattern corresponding to the set mask area and optimize size and/or position of the mask area by evaluating contrast of a composite image generated in a state in which illumination light is emitted in accordance with a radiation pattern corresponding to each mask area while at least one of size and position of the mask area is changed. ### Claim 13 (depends on 1) The image measurement system according to claim 1, wherein the controller is further configured to allow the projector to emit illumination light in accordance with a predetermined reference radiation pattern and determine the correspondence in the position, based on a projection pattern appearing in an image captured by the imager. ### Claim 14 A controller, comprising a processor and storage, for use in an image measurement system including a projector for emitting illumination light, a display and an imager operative to capture an image and having a field of view in which an area irradiated with the illumination light exists, the controller configured to: instruct the projector to emit illumination light in accordance with a radiation pattern; display on the display an image of the field of view captured by the imager in a state in which the illumination light is emitted; receive a setting of a mask area in association with the image displayed on the display, the mask area being an area in which the quantity of illumination light is to be reduced compared with another area in the field of view; and update the radiation pattern in accordance with the set mask area, based on a correspondence in position between the radiation pattern of the projector and a projection pattern produced in the field of view by the radiation pattern, wherein the controller is further configured to extract an area having a pixel value matching a predetermined condition in the image of the field of view, as a candidate for mask area, and wherein the controller is configured to determine the predetermined condition, based on each of images of the field of view captured in a state in which the quantity of illumination light emitted from the projector is varied into multiple levels.