# US 10,312,461 B2 · Flexible OLED display panel having a substrate with a titanium layer and method for manufacturing same

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- Number: US 10,312,461 B2
- Document ID: US10312461B2
- Status: Granted
- Kind: B2
- Application number: 15/735,609
- Filed: 2017-11-22
- Published: 2019-05-02
- Granted: 2019-06-04
- Earliest claimed: 2017-11-22
- Assignees: Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Applicants: Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Inventors: Fang Qin
- Web page: https://patentgrep.com/patent/US10312461B2

## CPC

- G09F 9/30: in which the desired character or characters are formed by combining individual elements (panels comprising a number of electrodes in a single cell controlling light arriving from an independent light source, e.g. electro-optical or magneto-optical cell, G02F1/00)
- H10K 59/1213: {the pixel elements being TFTs}
- H10K 59/126: Shielding, e.g. light-blocking means over the TFTs
- H10K 59/873: {Encapsulations}
- H10K 71/00: Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K 71/80: using temporary substrates
- H10K 77/111: {Flexible substrates}
- H10K 59/12: Active-matrix OLED [AMOLED] displays
- H10K 59/1201: {Manufacture or treatment}
- H10K 2102/311: {Flexible OLED}
- Y02E 10/549: Organic PV cells
- G09F: DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES
- Y02E: REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION

## Abstract

The present disclosure provides a flexible organic light-emitting diode (OLED) display panel including a flexible substrate and a plurality of thin film transistor (TFT) devices disposed on the flexible substrate. The flexible substrate comprises: a first polyimide (PI) layer; a first inorganic barrier layer disposed on a surface of the first PI layer; a titanium metal layer disposed on a surface of the first inorganic barrier layer; a second PI layer disposed on a surface of the titanium metal layer; and a second inorganic barrier layer disposed on a surface of the second PI layer. The TFT devices are disposed on a surface of the second inorganic barrier layer.

## Claims

### Claim 1

A flexible organic light-emitting diode (OLED) display panel including a flexible substrate and a plurality of thin film transistor (TFT) devices disposed on the flexible substrate, the flexible substrate comprising:
a first polyimide (PI) layer;
a first inorganic barrier layer disposed on a surface of the first PI layer;
a titanium metal layer disposed on a surface of the first inorganic barrier layer, wherein the titanium metal layer is patterned to form a pattern of the titanium metal layer;
a second PI layer directly disposed on a surface of the titanium metal layer; and
a second inorganic barrier layer disposed on a surface of the second PI layer;
wherein the TFT devices are disposed on a surface of the second inorganic barrier layer;
wherein the TFT devices include at least an active layer, a projection of the pattern of the titanium metal layer on the second inorganic barrier layer corresponds to a pattern of the active layer, and the pattern of the titanium metal layer is positioned opposite to the active layer.

### Claim 2 (depends on 1)

The flexible OLED display panel according to claim 1, wherein the first inorganic barrier layer and the second inorganic barrier layer are made of TiO2.

### Claim 3 (depends on 1)

The flexible OLED display panel according to claim 1, wherein a thickness of the first PI layer and a thickness of the second PI layer are same, a thickness of the first inorganic barrier layer and a thickness of the second inorganic barrier layer are same, and the thickness of the first inorganic barrier layer and the thickness of the second inorganic barrier layer are one third of the thickness of the first PI layer and the thickness of the second PI layer.

### Claim 4 (depends on 3)

The flexible OLED display panel according to claim 3, wherein a thickness of the titanium metal layer, the thickness of the first inorganic barrier layer, and the thickness of the second inorganic barrier layer are same.

### Claim 5

A flexible organic light-emitting diode (OLED) display panel including a flexible substrate and a plurality of thin film transistor (TFT) devices disposed on the flexible substrate, the flexible substrate comprising:
a first polyimide (PI) layer;
a first inorganic barrier layer disposed on a surface of the first PI layer;
a titanium metal layer disposed on a surface of the first inorganic barrier layer, wherein the titanium metal layer is patterned;
a second PI layer directly disposed on a surface of the titanium metal layer; and
a second inorganic barrier layer disposed on a surface of the second PI layer;
wherein the TFT devices are disposed on a surface of the second inorganic barrier layer.

### Claim 6 (depends on 5)

The flexible OLED display panel according to claim 5, wherein the first inorganic barrier layer and the second inorganic barrier layer are made of TiO2.

### Claim 7 (depends on 5)

The flexible OLED display panel according to claim 5, wherein a thickness of the first PI layer and a thickness of the second PI layer are same, a thickness of the first inorganic barrier layer and a thickness of the second inorganic barrier layer are same, and the thickness of the first inorganic barrier layer and the thickness of the second inorganic barrier layer are one third of the thickness of the first PI layer and the thickness of the second PI layer.

### Claim 8 (depends on 7)

The flexible OILED display panel according to claim 7, wherein a thickness of the titanium metal layer, the thickness of the first inorganic barrier layer, and the thickness of the second inorganic barrier layer are same.

### Claim 9

A method for manufacturing a flexible organic light-emitting diode (OLED) display panel, comprising:
a step S10 of providing a glass base plate;
a step S20 of forming a first polyimide (PI) layer on the glass base plate;
a step S30 of forming a first inorganic barrier layer on the surface of the first PI layer;
a step S40 of forming a titanium metal layer on a surface of the first inorganic barrier layer;
a step S50 of forming a second PI layer directly on a surface of the titanium metal layer;
a step S60 of forming a second inorganic barrier layer on a surface on the second PI layer; and
a step S70 of forming a plurality of thin film transistor (TFT) devices on a surface of the second inorganic barrier layer;
wherein the step S40 further comprises:
a step S401 of patterning the titanium metal layer to form a pattern on the titanium metal layer.

### Claim 10 (depends on 9)

The method for manufacturing the flexible OLED display panel according to claim 9, wherein the step S70 comprises:
a step S701 of correspondingly forming the TFT devices directly above and opposite to the pattern of the titanium-metal layer.

### Claim 11 (depends on 9)

The method for manufacturing the flexible OLED display panel according to claim 9, wherein the method further comprises:
a step S80 of using a laser to separate the first PI layer from the glass base plate.