# US 10,310,647 B2 · Touch-controlled panel, method of manufacturing the same, and display device

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- Number: US 10,310,647 B2
- Document ID: US10310647B2
- Status: Granted
- Kind: B2
- Application number: 15/232,949
- Filed: 2016-08-10
- Published: 2017-07-13
- Granted: 2019-06-04
- Earliest claimed: 2016-01-11
- Assignees: Boe Technology Group Co., Ltd.; Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Applicants: BOE Technology Group Co., Ltd.; Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Inventors: Yunhai Wan; Wenlong Wang; Tao Ma; Binbin Cao; Chengshao Yang
- Web page: https://patentgrep.com/patent/US10310647B2

## CPC

- G06F 3/0412: {Digitisers structurally integrated in a display}
- G06F 3/0443: {using a single layer of sensing electrodes}
- G06F 3/0446: {using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes}
- H10D 86/0231: {using masks, e.g. half-tone masks}
- H10D 86/441: {Interconnections, e.g. scanning lines}
- H10D 86/60: wherein the TFTs are in active matrices
- G06F 2203/04103: Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
- G06F 2203/04111: Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate
- G06F: ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models G06N)
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES

## Abstract

Embodiments of the present invention discloses a touch-controlled panel and a method of manufacturing the same, and a display device, to reduce the number of masks and production cost. The method of manufacturing a touch-controlled panel includes: forming a first electrode and a second electrode on a substrate through a patterning process, the first electrode and the second electrode being broken at a position where they are overlapped; depositing a layer of an organic film and forming an organic film fully remained region, an organic film partially remained region and an organic film removed region from the organic film through a mask; depositing a conductive layer and coating a photoresist on the conductive layer, and then forming a photoresist fully remained region, a photoresist partially remained region and a photoresist removed region through the mask.

## Claims

### Claim 1

A method of manufacturing a touch-controlled panel, comprising:
forming a first electrode and a second electrode on a substrate through a patterning process, both the first electrode and the second electrode being broken at a position where they are overlapped;
depositing a layer of an organic film on the substrate on which the first electrode and the second electrode have been formed, and forming an organic film fully remained region, an organic film partially remained region and an organic film removed region from the organic film through a mask, wherein the organic film removed region corresponds to a region where a bridging connection layer provided in a subsequent step is in contact with the first electrode or the second electrode, the organic film partially remained region corresponds to a region where the bridging connection layer will be provided in a subsequent step, and a portion of the organic film corrsponding to the organic film fully remained region and the organic film partially remained region constitutes a first organic film;
depositing a conductive layer and coating a photoresist on the conductive layer, and then forming a photoresist fully remained region, a photoresist partially remained region and a photoresist removed region through the mask, wherein the photoresist fully remained region corresponds to a region where the conductive layer is in contact with the first electrode or the second electrode, and the photoresist partially remained region corresponds to the region where the bridging connection layer will be provided;
etching the conductive layer where the above steps have been finished, and removing the residual photoresist, so as to form the bridging connection layer.

### Claim 2 (depends on 1)

The method as claimed in claim 1, wherein the first electrode and the second electrode are transparent electrodes; or the first electrode and the second electrode are metal electrodes.

### Claim 3 (depends on 2)

The method as claimed in claim 2, wherein the conductive layer is a transparent conductive layer; or the conductive layer is a metal conductive layer.

### Claim 4 (depends on 3)

The method as claimed in claim 3, wherein the substrate is a substrate of an array substrate;
in a situation where the first electrode and the second electrode are transparent electrodes, the first electrode and the second electrode are formed in the same layer as a pixel electrode, or are formed in the same layer as a common electrode; and
in a situation where the first electrode and the second electrode are metal electrodes, the first electrode and the second electrode are formed in the same layer as a gate electrode, or are formed in the same layer as source and drain electrodes.

### Claim 5 (depends on 3)

The method as claimed in claim 3, wherein the substrate is a substrate of an array substrate;
in a situation where the conductive layer is a transparent conductive layer, the conductive layer is formed in the same layer as a pixel electrode, or is formed in the same layer as a common electrode; and
in a situation where the conductive layer is a metal conductive layer, the conductive layer is formed in the same layer as a gate electrode, or is formed in the same layer as source and drain electrodes.

### Claim 6 (depends on 1)

The method as claimed in claim 1, wherein the organic film is formed of a negative photoresist and the photoresist is a positive photoresist; or, the organic film is formed of a positive photoresist and the photoresist is a negative photoresist.

### Claim 7 (depends on 6)

The method as claimed in claim 6, wherein the mask is a gray-tone mask or a half-tone mask.

### Claim 8 (depends on 7)

The method as claimed in claim 7, further comprising: forming a second organic film, through a patterning process, on the substrate on which the first organic film and the bridging connection layer have been formed.