# US 10,310,388 B2 · Metrology method and apparatus and associated computer product > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,310,388 B2 - Document ID: US10310388B2 - Status: Granted - Kind: B2 - Application number: 15/874,972 - Filed: 2018-01-19 - Published: 2018-08-02 - Granted: 2019-06-04 - Earliest claimed: 2017-02-02 - Assignees: ASML Netherlands B.V. - Applicants: ASML Netherlands B.V. - Inventors: Adam Urbanczyk; Hans Van Der Laan; Grzegorz Grzela; Alberto Da Costa Assafrao; Chien-Hung Tseng; Jay Jianhui Chen - Web page: https://patentgrep.com/patent/US10310388B2 ## CPC - G03F 7/70625: {Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness} - G01N 21/47: Scattering, i.e. diffuse reflection (G01N21/25, G01N21/41 take precedence {G01N21/55 takes precedence}) - G03F 7/70516: {Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors} - G03F 7/70525: {Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure} - G03F 7/70633: {Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching} - G01N 2021/95615: {with stored comparision signal} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q) ## Abstract Disclosed is a process monitoring method, and an associated metrology apparatus. The method comprises: comparing measured target response spectral sequence data relating to the measurement response of actual targets to equivalent reference target response sequence data relating to a measurement response of the targets as designed; and performing a process monitoring action based on the comparison of said measured target response sequence data and reference target response sequence data. The method may also comprise determining stack parameters from the measured target response spectral sequence data and reference target response spectral sequence data. ## Claims ### Claim 1 A method of metrology in a metrology apparatus for monitoring a measurement process, comprising: obtaining measured target response sequence data relating to a measurement response of one or more targets formed on a substrate by a lithographic process to measurement radiation comprising a plurality of measurement profiles, wherein the measured target response sequence data describes a variation of the measurement response of the one or more targets in response to variations of the plurality of measurement profiles; obtaining reference target response sequence data relating to a measurement response of the one or more targets as designed to the measurement radiation, wherein the reference target response sequence data describes an optimal measurement response of the one or more targets in response to a designed plurality of measurement profiles without un-designed variation; comparing the measured target response sequence data and reference target response sequence data; and determining a measurement validity based on the comparison of the measured target response sequence data and reference target response sequence data. ### Claim 2 (depends on 1) The method of claim 1, wherein the comparison step comprises determining a similarity metric relating to the similarity of the measured target response sequence data to the reference target response sequence data. ### Claim 3 (depends on 2) The method of claim 2, wherein the comparison step comprises comparing the similarity metric to a threshold similarity metric; and the step of determining the measurement validity comprises determining the measurement validity based on the comparing of the similarity metric to the threshold similarity metric, the measurement validity relating to a validity of measurements of the one or more targets using measurement radiation having a corresponding measurement profile in accordance with a target-measurement parameter combination. ### Claim 4 (depends on 3) The method of claim 3, wherein the target-measurement parameter combination comprises an optimized target-measurement parameter combination determined in a previous optimization step. ### Claim 5 (depends on 4) The method of claim 4, further comprising performing the optimization step. ### Claim 6 (depends on 4) The method of claim 4, wherein the reference target response sequence data is determined in the optimization step. ### Claim 7 (depends on 3) The method of claim 3, wherein, where the comparison of the similarity metric to the threshold similarity metric indicates too great a dissimilarity, the measurement validity is deemed to be invalid, otherwise the measurement validity is deemed to be valid. ### Claim 8 (depends on 7) The method of claim 7, further comprising, where the measurement validity is deemed to be invalid, performing an optimization update step to determine a measurement profile optimized to the one or more targets as measured. ### Claim 9 (depends on 8) The method of claim 8, wherein, the optimization update step comprises an in-line measurement profile optimization based upon the measured target response sequence data. ### Claim 10 (depends on 7) The method of claim 7, further comprising, where the measurement validity is deemed to be invalid, selecting a different one or more targets for measurement. ### Claim 11 (depends on 7) The method of claim 7, further comprising, where the measurement validity is deemed to be invalid, performing a corrective action to the lithographic process. ### Claim 12 (depends on 1) The method of claim 1, wherein the step of comparing the measured target response sequence data to the reference target response sequence data is performed using a dynamic time warping algorithm. ### Claim 13 (depends on 1) The method of claim 1, wherein the measured target response sequence data and reference target response sequence data each comprise data describing the variation of the target response with measurement radiation wavelength. ### Claim 14 (depends on 1) The method of claim 1, wherein the measured target response sequence data and reference target response sequence data is determined in terms of an intensity metric. ### Claim 15 (depends on 14) The method of claim 14, wherein the intensity metric comprises an intensity asymmetry metric, derived from the intensity difference between corresponding pairs of non-zeroth diffraction orders. ### Claim 16 (depends on 15) The method of claim 15, wherein the intensity asymmetry metric comprises overlay sensitivity, the overlay sensitivity comprising a proportionality constant in a relationship between a function of an overlay offset between periodic structures of a target and the intensity difference. ### Claim 17 (depends on 15) The method of claim 15, wherein the intensity asymmetry metric comprises stack sensitivity, wherein stack sensitivity is the ratio of the overlay sensitivity to a measured average intensity, the overlay sensitivity comprising a proportionality constant in a relationship between a function of an overlay offset between periodic structures of a target and the intensity difference. ### Claim 18 A metrology apparatus comprising: an illumination system configured to illuminate one or more targets formed on a substrate by a lithographic process with measurement radiation comprising a plurality of measurement profiles; a detection system configured to detect scattered radiation arising from illumination of the one or more targets; and a processor operable to: derive measured target response sequence data from the detected scattered radiation, wherein the measured target response sequence data describes a variation of a measurement response of the one or more targets in response to variations of the plurality of measurement profiles; compare the measured target response sequence data to reference target response sequence data relating to a measurement response of the one or more targets as designed to the measurement radiation, wherein the reference target response sequence data describes an optimal measurement response of the one or more targets in response to a designed plurality of measurement profiles without un-designed variation; and determine a measurement validity based on the comparison of the measured target response sequence data and reference target response sequence data. ### Claim 19 A non-transitory computer program product comprising machine readable instructions which, when run on a suitable processor of a lithographic system, cause the processor to perform a method of metrology in a metrology apparatus for monitoring a measurement process, the method comprising: obtaining measured target response sequence data relating to a measurement response of one or more targets formed on a substrate by a lithographic process to measurement radiation comprising a plurality of measurement profiles, wherein the measured target response sequence data describes a variation of the measurement response of the one or more targets in response to variations of the plurality of measurement profiles; obtaining reference target response sequence data relating to a measurement response of the one or more targets as designed to the measurement radiation, wherein the reference target response sequence data describes an optimal measurement response of the one or more targets in response to a designed plurality of measurement profiles without un-designed variation; comparing the measured target response sequence data and reference target response sequence data; and determining a measurement validity based on the comparison of the measured target response sequence data and reference target response sequence data. ### Claim 20 (depends on 1) The method of claim 1, wherein the variations of the plurality of measurement profiles comprises at least one of the following: variations of an intensity distribution of the measurement radiation of the plurality of measurement profiles; variations of a wavelength of the measurement radiation of the plurality of measurement profiles; variations of a polarization of the measurement radiation of the plurality of measurement profiles; and variations of an illumination angle relative to the substrate of the measurement radiation of the plurality of measurement profiles.