# US 10,310,050 B2 · Method and apparatus for calculating offset of wheatstone bridge type sensor

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- Number: US 10,310,050 B2
- Document ID: US10310050B2
- Status: Granted
- Kind: B2
- Application number: 15/702,578
- Filed: 2017-09-12
- Published: 2018-06-28
- Granted: 2019-06-04
- Earliest claimed: 2016-12-23
- Assignees: Korea Electronics Technology Institute
- Applicants: Korea Electronics Technology Institute
- Inventors: Won Ki Park; Dae Sung Lee
- Web page: https://patentgrep.com/patent/US10310050B2

## CPC

- G01R 35/005: {Calibrating; Standards or reference devices, e.g. voltage or resistance standards, "golden" references (G01R33/0035, G01R35/002 take precedence)}
- G01R 17/105: {for measuring impedance or resistance}
- G01R 33/07: Hall effect devices
- G01R: MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES (indicating correct tuning of resonant circuits H03J3/12)

## Abstract

A method and an apparatus for calculating an offset of a Wheatstone bridge type sensor are described. The offset calculation method includes measuring resistances between nodes of a Wheatstone bridge type sensor, calculating an offset of the sensor using the measured resistances and providing information on the calculated offset. Accordingly, the offset of the Wheatstone bridge type sensor can be rapidly and easily calculated independently from the size of a bias current, and ultimately. Furthermore, time required to measure can be reduced and thus a sensor fabrication cost can be reduced, and also, mass production can be enhanced.

## Claims

### Claim 1

An apparatus for a planar hall resistance (PHR) sensor comprising a first node, a second node, a third node and a fourth node arranged in order, the apparatus comprising:
a first measurement unit configured to measure a first resistance between the first node and the second node when the PHR sensor is mounted in the apparatus;
a second measurement unit configured to measure a second resistance between the second node and the third node when the PHR sensor is mounted in the apparatus;
a third measurement unit configured to measure a third resistance between the third node and the fourth node when the PHR sensor is mounted in the apparatus;
a fourth measurement unit configured to measure a fourth resistance between the fourth node and the first node when the PHR sensor is mounted in the apparatus;
a reference offset calculator connected to the first, second, third and fourth measurement units and configured to apply the first, second, third and fourth resistances to a predetermined formula to calculate a reference offset of the PHR sensor, the reference offset being a value independent from a bias current of the PHP sensor;
a display connected to the reference offset calculator and configured to display the reference offset; and
an input device connected to the reference offset calculator configured to receive a user input of a first bias current,
wherein, in response to the user input, the reference offset calculator is further configured to compute a first offset for the PHR sensor based on the reference offset and the first bias current and wherein the display is further configured to display the first offset.

### Claim 2 (depends on 1)

The apparatus of claim 1, wherein the reference offset calculator is further configured to multiply the reference offset and the first bias current to compute the first offset.

### Claim 3 (depends on 1)

The apparatus of claim 1, wherein the reference offset calculator is configured to compute the reference offset based on the following relationship: (RA−RB+RC−RD)/2, where RA is the first resistance, RB is the second resistance, RC is the third resistance and RD is the fourth resistance.