# US 10,309,907 B2 · All reflective wafer defect inspection and review systems and methods > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,309,907 B2 - Document ID: US10309907B2 - Status: Granted - Kind: B2 - Application number: 15/055,292 - Filed: 2016-02-26 - Published: 2016-09-08 - Granted: 2019-06-04 - Earliest claimed: 2015-03-04 - Assignees: KLA-Tencor Corporation - Applicants: KLA-Tencor Corporation - Inventors: Shiyu Zhang; Wei Zhao - Web page: https://patentgrep.com/patent/US10309907B2 ## CPC - G01N 21/8806: {Specially adapted optical and illumination features} - G01N 21/9501: {Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20)} - G02B 13/143: {for use with ultraviolet radiation} - G02B 17/0652: {on-axis systems with at least one of the mirrors having a central aperture} - G03F 1/84: Inspecting - G03F 7/7065: {Defects, e.g. optical inspection of patterned layer for defects} - G01N 21/956: Inspecting patterns on the surface of objects {(contactless testing of electronic circuits G01R31/308; testing currency G07D; manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20)} - G01N 2021/8845: {Multiple wavelengths of illumination or detection} - G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q) - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract Disclosed are methods and apparatus for reflecting, towards a sensor, an Infrared to vacuum ultra-violet (VUV) light that is reflected from a target substrate. The system includes a first mirror arranged to receive and reflect the Infrared to VUV light that is reflected from the target substrate and a second mirror arranged to receive and reflect Infrared to VUV light that is reflected by the first mirror. The first and second mirrors are arranged and shaped so as to reflect Infrared to VUV light from the target substrate towards an optical axis of the apparatus. In another embodiment, the apparatus can also include a third mirror arranged to receive and reflect the Infrared to VUV light that is reflected by the second mirror and a fourth mirror arranged to receive and reflect such illuminating light that is reflected by the third mirror towards the sensor. In one more embodiment, a reflecting or refracting optics is used to relay the image by above optics to the sensor; various magnification is achieved by adjusting the distance between the intermediate image and the relay optics. ## Claims ### Claim 1 An apparatus for reflecting, towards a sensor, an illuminating light that is reflected from a target substrate, the apparatus comprising: an illumination source for generating Infrared to Vacuum UV spectral band light that illuminates a target substrate; objective optics for receiving and reflecting Infrared to Vacuum UV spectral light that is reflected from the target substrate in response to the generated Infrared to Vacuum UV spectral band light that illuminates the target substrate; and a sensor for detecting Infrared to Vacuum UV spectral light that is reflected by the objective optics, wherein the objective optics comprises a first mirror arranged to receive and reflect Infrared to Vacuum UV spectral light that is reflected from the target substrate, a second mirror arranged to receive and reflect Infrared to Vacuum UV spectral light that is reflected by the first mirror, wherein the first and second mirrors are arranged and shaped so as to reflect Infrared to Vacuum UV spectral light from the target substrate towards an optical axis of the apparatus, wherein the numerical aperture (NA) for the reflected Infrared to Vacuum UV spectral light received at the second mirror is larger than the NA for the reflected Infrared to Vacuum UV spectral light received at the first mirror so as to result in a working distance for the objective optics greater than 10 mm, a third mirror arranged to receive and reflect Infrared to Vacuum UV spectral light that is reflected by the second mirror, wherein the first and second mirrors are arranged to form an intermediate image between the second and third mirror, and a fourth mirror arranged to receive and reflect Infrared to Vacuum UV spectral light that is reflected by the third mirror towards the sensor. ### Claim 2 (depends on 1) The apparatus of claim 1, wherein the target substrate is a semiconductor wafer. ### Claim 3 (depends on 1) The apparatus of claim 1, wherein at least one of the first and second mirrors is aspheric so as to reduce a central obscuration on the fourth mirror. ### Claim 4 (depends on 1) The apparatus of claim 1, wherein the first mirror is spherical and the second, third and fourth mirrors are aspheric. ### Claim 5 (depends on 4) The apparatus of claim 4, wherein the first and third mirrors are concave, and the second and fourth mirrors are convex. ### Claim 6 (depends on 1) The apparatus of claim 1, wherein the first and second mirrors are spherical and the third and fourth mirrors are aspheric, and wherein the first, third, and fourth mirrors are concave, and the second mirror is convex. ### Claim 7 (depends on 1) The apparatus of claim 1, wherein the first, second, third, and fourth mirrors are aspheric, and wherein the first, third, and fourth mirrors are concave, and the second mirror is convex. ### Claim 8 (depends on 1) The apparatus of claim 1, wherein a magnification between from the target substrate to an image sensor is between 2× and 1500×. ### Claim 9 (depends on 1) The apparatus of claim 1, wherein a magnification between from the target substrate to the intermediate image is between 2× and 1500×. ### Claim 10 (depends on 1) The apparatus of claim 1, wherein the fourth mirror's size is minimized to limit a back focal distance. ### Claim 11 (depends on 1) The apparatus of claim 1, further comprising one or more folding mirrors to receive light reflected from the fourth mirror and to relay an intermediate image onto the sensor so as to minimize the footprint of the apparatus. ### Claim 12 (depends on 11) The apparatus of claim 11, wherein the one or more folding mirrors comprise a relay mirror, and wherein the apparatus further comprises a positioning mechanisms for moving the relay mirror so as to vary a distance between an intermediate image and the relay and change a magnification. ### Claim 13 (depends on 11) The apparatus of claim 11, wherein the one or more folding mirrors comprise multiple relay mirrors with different focal lengths, and wherein the apparatus further comprises a positioning mechanisms for switching in different ones of the relay mirrors so as to vary a distance between an intermediate image and the relay and change a magnification. ### Claim 14 (depends on 1) The apparatus of claim 1, wherein a gap between the second mirror and the fourth mirror has a size into which illumination and/or autofocus is inserted. ### Claim 15 (depends on 14) The apparatus of claim 14, wherein Infrared to VUV light between the second and third mirrors is near collimated. ### Claim 16 An objective optics system for reflecting Infrared to vacuum ultra-violet (VUV) spectral band light that is reflected from a target substrate in response to Infrared to VUV light that illuminates the target substrate, the system comprises: a first mirror arranged to receive and reflect Infrared to VUV light that is reflected from the target substrate, a second mirror arranged to receive and reflect VUV light that is reflected by the first mirror, wherein the first and second mirrors are arranged and shaped so as to reflect Infrared to VUV light from the target substrate towards an optical axis of the apparatus, wherein the numerical aperture (NA) for the reflected Infrared to Vacuum UV spectral light received at the second mirror is larger than the NA for the reflected Infrared to Vacuum UV spectral light received at the first mirror so as to result in a working distance for the objective optics greater than 10 mm, a third mirror arranged to receive and reflect Infrared to VUV light that is reflected by the second mirror, wherein the first and second mirrors are arranged to form an intermediate image between the second and third mirror, and a fourth mirror arranged to receive and reflect the Infrared to VUV light that is reflected by the third mirror towards the sensor. ### Claim 17 An apparatus for reflecting, towards a sensor, Infrared to vacuum ultra-violet (VUV) light that is reflected from a target substrate, the apparatus comprising: an illumination source for generating Infrared to VUV light that illuminates a target substrate; objective optics for receiving and reflecting Infrared to VUV light that is reflected from the target substrate in response to the generated Infrared to VUV spectral band light that illuminates the target substrate; and a sensor for detecting Infrared to VUV light that is reflected by the objective optics, wherein the objective optics comprises a first mirror arranged to receive and reflect Infrared to VUV light that is reflected from the target substrate, and a second mirror arranged to receive and reflect Infrared to VUV light that is reflected by the first mirror towards the sensor, wherein the first and second mirrors are arranged and shaped so as to reflect Infrared to VUV light from the target substrate towards an optical axis of the apparatus, wherein the ray numerical aperture (NA) increases on the second mirror as compared to on the first mirror so as to result in a working distance for the objective optics that is greater than 10 mm. ### Claim 18 (depends on 17) The apparatus of claim 17, wherein the first mirror is a concave spherical mirror and the second mirror is a convex spherical mirror, and wherein the first and second mirrors are aspheric. ### Claim 19 (depends on 17) The apparatus of claim 17, wherein a magnification between from the target substrate to an image sensor is between 2× and 1500×. ### Claim 20 (depends on 17) The apparatus of claim 17, wherein a magnification between from the target substrate to an intermediate image is between 2× and 1500×. ### Claim 21 (depends on 20) The apparatus of claim 20, further comprising one or more folding mirrors to receive Infrared to VUV light reflected from the second mirror and relay an intermediate image onto the sensor so as to minimize a size of the apparatus. ### Claim 22 (depends on 17) The apparatus of claim 17, wherein the second mirror's size is minimized to limit a back focal distance.