# US 10,309,006 B2 · Methods for directed irradiation synthesis with ion and thermal beams > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,309,006 B2 - Document ID: US10309006B2 - Status: Granted - Kind: B2 - Application number: 15/924,026 - Filed: 2018-03-16 - Published: 2018-07-26 - Granted: 2019-06-04 - Earliest claimed: 2012-11-06 - Assignees: Purdue Research Foundation - Applicants: Purdue Research Foundation - Inventors: Jean Paul Allain; Osman J. El-Atwani; Juan Jose Pavon Palacio - Web page: https://patentgrep.com/patent/US10309006B2 ## CPC - C23C 14/221: {Ion beam deposition (C23C14/46, C23C14/48 take precedence)} - B82Y 40/00: Manufacture or treatment of nanostructures - H01J 37/302: Controlling tubes by external information, e.g. program control (H01J37/304 takes precedence) - H01J 37/304: Controlling tubes by information coming from the objects {or from the beam}, e.g. correction signals - H01J 2237/317: Processing objects on a microscale - Y10S 977/896: Chemical synthesis, e.g. chemical bonding or breaking - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - Y10S: TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS ## Abstract A method for fabricating structures includes on a substrate includes providing a set of control parameters to an ion beam source and to a thermal source corresponding to a desired structure topology. The method also includes using directed irradiation synthesis to form nano structures and/or microstructures in a first surface area of the substrate by exposing the substrate surface to an ion beam from the ion beam source and to thermal particles from the thermal source. The ion beam having a first area of effect on the substrate surface, and the thermal particles having a second area of effect on the substrate surface, each of the first area of effect and the second area of effect including the first surface area. ## Claims ### Claim 1 A method for fabricating structures on a substrate, comprising: a) providing the substrate having a substrate surface; and b) providing a set of control parameters to an ion beam source and to a thermal source corresponding to a desired structure topology; c) using directed irradiation synthesis to form a plurality of structures comprising at least one of the group of nano structures and microstructures in a first surface area of the substrate by exposing the substrate surface to an ion beam from the ion beam source and to thermal particles from the thermal source, the ion beam having a first area of effect on the substrate surface, and the thermal particles having an second area of effect on the substrate surface, each of the first area of effect and the second area of effect including the first surface area; and wherein the set of control parameters includes a predetermined ratio of a flux of the ion beam to a flux of the thermal beam, the predetermined ratio configured to form self-organized structures of the desired structure topology. ### Claim 2 (depends on 1) The method of claim 1, wherein the substrate surface comprises a metal thin film substrate. ### Claim 3 (depends on 2) The method of claim 2, wherein the metal thin film substrate comprises Rh, Ru or Pd. ### Claim 4 (depends on 3) The method of claim 3, wherein the thermal particles are metal thermal particles. ### Claim 5 (depends on 1) The method of claim 1, wherein the ion beam source comprises a focused ion beam source. ### Claim 6 (depends on 5) The method of claim 5, wherein step c) further comprises forming the plurality of structures by additionally exposing the substrate surface to a second ion beam from a broad beam ion source, the broad beam ion source generating a broad ion beam having an area of effect that exceeds the first area of effect. ### Claim 7 A method for fabricating structures on a substrate, comprising: a) providing a substrate having a thin film substrate surface; b) generating nanostructures or microstructures on the substrate surface at least in part by exposing the substrate surface to thermal particles from a thermal particle source while irradiating the substrate surface with an ion beam; c) obtaining a measurement of a characteristic of the substrate surface; d) adjusting at least one of the thermal particle source and the ion beam based on the measurement; and wherein step c) further comprises obtaining at least one characteristic of an emitted species generated in step b); and step b) further comprises generating the nanostructures or microstructures by inducing spontaneous self-organized patterns on the surface of the thin-film substrate surface. ### Claim 8 (depends on 7) The method of claim 7, wherein the at least one characteristic comprises an emission angle of the emitted species. ### Claim 9 (depends on 7) The method of claim 7, wherein the at least one characteristic comprises an energy value. ### Claim 10 (depends on 7) The method of claim 7, wherein the at least one characteristic comprises a flux value. ### Claim 11 (depends on 7) The method of claim 7, further comprising employing a probe to obtain a surface characteristic of the substrate surface. ### Claim 12 (depends on 11) The method of claim 11, wherein the surface characteristic comprises at least one of the group consisting of a chemical property, an electronic property and an optical property.