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US 10,300,554 B2Granted
Wafer alignment method and system
AssigneeIllumina, Inc.
InventorsPeter Mains, Anmiv S. Prabhu, Richard Capella, Kevan Samiee
Life of this patent
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Abstract
Wafers are aligned with one another by reference to features formed on or in each wafer. Notches are formed in each wafer, including a pivot-notch that allows for two-point contact, and a stop-notch that provides for single-point contact. A bias-notch is formed for pressing the wafers into engagement with the two-contact element when it is in the pivot-notch and with the single-contact element when it is in the stop-notch. The wafers may be bonded to one another to maintain the alignment of the referenced features.
Claims11
A system, comprising:
- a wafer notched for alignment with a second wafer, the wafer comprising:
- a pivot-notch formed by reference to a feature formed on or in the wafer;
- a stop-notch approximately across from the pivot-notch and formed by reference to the feature formed on or in the wafer;
- and
- a bias-notch on a side of the wafer between the pivot-notch and the stop-notch and at a location where a biasing force exerted on the bias-notch will urge the pivot-notch into two-point contact with a two-contact alignment element of a fixture and also urge the stop-notch into single-point contact with a single-contact alignment element of the fixture.
2 more elements
A system, comprising:
- a notching station to form notches in first and second wafers, the notches in each wafer comprising:
- a pivot-notch formed by reference to a feature formed on or in the respective wafer;
- a stop-notch across from the pivot-notch and formed by reference to the feature formed on or in the respective wafer;
- and
- a bias-notch on a side of the respective wafer between the pivot-notch and the stop-notch and at a location where a biasing force exerted on the bias-notch will urge the pivot-notch of the respective wafer into two-point contact with a two-contact alignment element of a fixture and also urge the stop-notch of the respective wafer into single-point contact with a single-point alignment element of the fixture;
- the fixture to align the features of the first and second wafers with one another, the fixture comprising:
- the two-contact alignment element that contacts the pivot-notches of the wafers;
- the single-contact alignment element that contacts the stop-notches, of the wafers;
- and
- a biasing element that urges the pivot-notches into contact with the two-contact alignment element and the stop-notches into contact with the single-contact element;
- and
- a bonding station to bond the first wafer with respect to the second wafer after alignment.
9 more elements
Dependencies are inferred from the claim text.