EUV source chamber and gas flow regime for lithographic apparatus, multi-layer mirror and lithographic apparatus
AssigneeASML Netherlands B.V.
InventorsHeine Melle Mulder, Andrey Sergeevich Tychkov, Willem Van Schaik
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Abstract
Disclosed is a radiation source module and a radiation collector for the module with the radiation collector comprising a substrate coated with at least one reflective layer and a plurality of perforations within the reflective layer, with the plurality of holes forming vertices of a grid substantially covering the surface, and wherein the coating may comprise multiple layers.
Claims20
A radiation source module operable to generate a plasma that produces EUV radiation at a plasma formation site by excitation of a fuel, the radiation source module comprising a radiation collector for collecting and focusing the EUV radiation, the radiation collector comprising a coating configured to reflect the EUV radiation, the coating having a plurality of holes extending from a surface of the radiation collector into the coating, the plurality of holes forming vertices of a grid substantially covering the surface.
A radiation collector for collecting and focusing EUV radiation, the radiation collector comprising a coating configured to reflect the EUV radiation, the coating having a plurality of holes extending from a surface of the radiation collector into the coating, the plurality of holes forming vertices of a grid substantially covering the surface.
A radiation collector for collecting and focusing EUV radiation, the radiation collector comprising a coating configured to reflect the radiation, the coating having a plurality of holes extending from a surface of the radiation collector into the coating, the plurality of holes forming vertices of a grid substantially covering the surface, wherein the coating comprises multiple layers.
A lithographic system comprising:
- a radiation source module operable to generate a plasma that produces EUV radiation at a plasma formation site by excitation of a fuel, the radiation source module comprising a radiation collector for collecting and focusing the EUV radiation, the radiation collector comprising a coating configured to reflect the EUV radiation, the coating having a plurality of holes extending from a surface of the radiation collector into the coating, the plurality of holes forming vertices of a grid substantially covering the surface;
- and
- a lithographic apparatus operative to use the EUV radiation for imaging a pattern onto a substrate.
A lithographic system comprising:
- a radiation source module operable to generate a plasma that produces EUV radiation at a plasma formation site by excitation of a fuel, the radiation source module comprising a radiation collector for collecting and focusing the EUV radiation, the radiation collector comprising a coating configured to reflect the radiation, the coating having a plurality of holes extending from a surface of the radiation collector into the coating, the plurality of holes forming vertices of a grid substantially covering the surface, wherein the coating comprises multiple layers;
- and
- a lithographic apparatus operative to use the EUV radiation for imaging a pattern onto a substrate.
Dependencies are inferred from the claim text.