Method for determining the parameters of an IC manufacturing process model

A computer program for determining a process model for manufacturing a semiconductor integrated circuit defined by a target design to be printed on a substrate, said computer program comprising:

• one or more interfaces for:
• processing the target design to be printed on the substrate;
• selecting a calibration set comprising a plurality of patterns stored in a memory of a computer;
• convoluting a compound of a kernel function and a deformation function with the target design, wherein the convoluting comprises selecting a shift angle for the deformation function;
• determining at least an input variable representative of a variance in features of said plurality of patterns;
• printing the plurality of patterns of the calibration set on the substrate;
• and
• measuring a series of values of the at least an input variable by determining a first series of the at least an input variable at a number of points on the plurality of patterns;
• computer code configured for measuring, at the number of points, a second series of values of an output variable representative of the printed patterns of the calibration set;
• and
• computer code configured for determining the process model as being one of a functional and associative relationship between the first series of values of the at least an input variable and the second series of values of the output variable.