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US 10,295,471 B2Granted
Plasma spectroscopic analysis method and inhibitor of plasma emission derived from non-target
AssigneeARKRAY, Inc.
InventorTokuo Kasai
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Abstract
A plasma spectroscopic analysis method includes a concentration process of concentrating a target in a sample, in the vicinity of one of a pair of electrodes in the presence of the sample; a plasma generation process of generating plasma in the sample by applying a voltage to the pair of electrodes; and a detection process of detecting emission of the target generated by the plasma, wherein the plasma generation process is performed in the presence of a defoaming agent.
Claims19
A plasma spectroscopic analysis method comprising:
- a concentration process of applying a first voltage to a pair of electrodes in a sample, thereby concentrating a target in the sample in the vicinity of one of the pair of electrodes in the sample;
- a plasma generation process of generating plasma in the vicinity of the one of the pair of electrodes in the sample by applying a second voltage to the pair of electrodes;
- a detection process of detecting emission of the target generated by the plasma;
- and
- an addition process of adding a defoaming agent to the sample before the plasma generation process.
2 more elements
Dependencies are inferred from the claim text.