US 10,295,339 B2 · Pattern measurement method and measurement apparatus

Abstract

A pattern measurement method and measurement apparatus are provided that appropriately evaluate the deformation of a pattern occurring due to a micro loading effect. In order to achieve the above-mentioned object, there are provided pattern measurement method and apparatus that measure a dimension of a pattern formed on a sample. In the pattern measurement method and apparatus, distances between a reference pattern and a plurality of adjacent patterns adjacent to the reference pattern or inner diameters of the reference pattern in a plurality of directions are measured, and the measurement results of the plurality of distances between the reference pattern and the adjacent patterns or the measurement results of the inner diameters of the reference pattern in the plurality of directions are classified according to distances between the reference pattern and the adjacent patterns or directions of the patterns adjacent to the reference pattern.

Claims8

Dependent claims

A pattern measurement method of measuring a dimension of a pattern formed on a sample based on a detection signal acquired based on irradiation of a charged particle beam, the method comprising:

obtaining an image representative of a plurality of patterns;
setting a reference pattern and a plurality of adjacent patterns adjacent to the reference pattern on the obtained image;
measuring distances between the reference pattern and the plurality of adjacent patterns;
classifying the measurement results of the plurality of distances between the reference pattern and the plurality of adjacent patterns according to distances between the reference pattern and the plurality of adjacent patterns;
performing statistical processing on each of the classified measurement results;
and
outputting a visual display of an index value indicating a degree of deformation of the plurality of adjacent patterns due to a micro loading effect obtained based on the statistical processing.

4 more elements

A pattern measurement apparatus comprising:

a memory to store an image processing program for measuring a dimension of a pattern formed on a sample based on a detection signal acquired based on irradiation of a charged particle beam;
and
a control terminal to:
obtain an image representative of a plurality of patterns,
set a reference pattern and a plurality of adjacent patterns adjacent to the reference pattern on the obtained image,
measure the dimension of the pattern formed on the sample based on the detection signal acquired based on irradiation of the charged particle beam,
measure distances between the reference pattern formed on the sample and the plurality of adjacent patterns,
classify the measurement results of the plurality of distances between the reference pattern and the plurality of adjacent patterns according to distances between the reference pattern and the plurality of adjacent patterns,
perform statistical processing on each of the classified measurement results;
and
output a visual display of an index value indicating a degree of deformation of the plurality of adjacent patterns due to a micro loading effect obtained based on the statistical processing.

8 more elements

Dependencies are inferred from the claim text.

Pattern measurement method and measurement apparatus

Life of this patent

Pattern measurement method and measurement apparatus

Life of this patent

Abstract

Claims8