Exhaust manifold in a CVD reactor

An apparatus for extracting a process gas from a chemical vapor deposition (CVD) or physical vapor deposition (PVD) reactor, the apparatus comprising an exhaust manifold (1) having a flow channel, wherein the flow channel comprises a suction opening (2), a gas extraction chamber (3) adjoining the suction opening (2) in a flow direction (S) and a gas collection chamber (5) disposed downstream of the gas extraction chamber (3) in the flow direction (S) and opening into a suction line (4), wherein the length of the suction opening (2) extending in a long side direction (L) is substantially greater than the width of the suction opening (2) extending in a narrow side direction (W) and wherein the gas extraction chamber (3) and the gas collection chamber (5) are delimited in such a manner by first long side walls (6) and second long side walls (8), respectively, extending in the long side direction (L) and narrow side walls (7) extending in the narrow side direction (W) that a gas flow is formed in the flow channel as a result of a negative pressure produced in the suction line (4), the apparatus characterized in that flow-impeding structures are provided in at least one intermediate space (9) between the gas extraction chamber (3) and the gas collection chamber (5), the flow-impeding structures configured to exert a greater flow resistance on the gas flow within a central zone (Z) located centrally between the narrow side walls (7) than within edge zones (R) arranged between the central zone (Z) and the narrow side walls (7).