Method of producing a patterned film
AssigneeCanon Kabushiki Kaisha
InventorsTakeshi Honma, Toshiki Ito, Shiori Yonezawa, Keiko Chiba, Keiji Yamashita
Life of this patent
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Abstract
In an imprint method in a condensable gas atmosphere, the force (mold releasing force) required to separate a mold from a resist cured film (mold release) has been large. A photocurable composition for performing imprint in an atmosphere containing a condensable gas includes a component (A) which is a (meth)acrylate monomer; a component (B) which is a photopolymerization initiator; and a component (C) which is a mold releasing agent. The saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 50% by weight or more, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm.
Claims6
A method for producing a patterned film, the method comprising:
- a step of placing a photocurable composition on a substrate;
- a step of bringing the photocurable composition into contact with a mold in an atmosphere containing a condensable gas, the mold having an original pattern for transferring a pattern shape;
- a step of irradiating the photocurable composition with light to form a cured film;
- and
- a step of separating the cured film from the mold,
- wherein the photocurable composition comprises:
- a component (A) which is a (meth)acrylate monomer;
- a component (B) which is a photopolymerization initiator;
- and
- a component (C) which is a mold releasing agent,
- wherein a saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 50% by weight or more, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm, and
- the condensable gas is a gas that becomes condensed and liquefies by a pressure of capillary action applied to the condensable gas by the photocurable composition during the step of bringing the photocurable composition into contact with the mold.
Dependencies are inferred from the claim text.