Polishing pad having polishing surface with continuous protrusions

A polishing pad for polishing a substrate, the polishing pad comprising:

• a polishing body having a polishing side opposite a back surface;
• and
• a polishing surface comprising a plurality of protrusions continuous with the polishing side of the polishing body, each protrusion having a modified-quadrilateral polygon shape in a plane of the polishing surface, wherein the plurality of protrusions is arranged in an X-Y grid pattern, wherein the polishing body and polishing surface are together homogeneous and unitary, and wherein the polishing body and polishing surface comprise a molded polyurethane material, and further comprising:
• a solid ring encompassing the plurality of protrusions at an outer most edge of the polishing side of the polishing body, the solid ring continuous with the polishing side of the polishing body, wherein a continuous groove is disposed between the solid ring and the plurality of protrusions.