Method of cleaning an evaporator
AssigneeI.D.E. Technologies Ltd.
InventorsTomer Efrat, Itamar Hite
Life of this patent
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Abstract
A method of cleaning an evaporator that includes at least one heat transfer element for the evaporation of water, comprising forming a sacrificial layer of a first material on a surface of the heat transfer element (1); evaporating water that includes a second material to deposit the second material on top of the sacrificial layer (2, 3); and cleaning the evaporator by removing both the sacrificial layer formed on the heat transfer element and the second layer formed on top of the sacrificial layer; wherein the first material is more easily removed from the heat transfer element than the second material (4).
Claims14
A method of cleaning an evaporator that includes at least one heat transfer element for evaporation of water, the method comprising:
- forming a sacrificial layer of a first material on a surface of the at least one heat transfer element;
- evaporating water that includes a second material to deposit the second material on top of the sacrificial layer;
- and removing both the sacrificial layer formed on the at least one heat transfer element and the second layer formed on top of the sacrificial layer;
- wherein the first material is more easily removed from the at least one heat transfer element than the second material;
- wherein forming the sacrificial layer on a surface of the evaporator at least one heat transfer element comprises supplying water to an evaporator in operation, wherein the supplied water includes the first material;
- wherein the first material is provided in supersaturation for precipitation on the at least one heat transfer element until the sacrificial layer is formed in a desired thickness;
- further comprising raising a pH level of the supplied water comprising the first material to facilitate precipitation of said first material.
Dependencies are inferred from the claim text.