Polysilicon manufacturing apparatus
AssigneeHanwha Chemical Corporation
InventorsSung Eun Park, Jiwoong Kim, Hee Dong Lee
Life of this patent
Estimating the term…
Loading patent…
AssigneeHanwha Chemical Corporation
InventorsSung Eun Park, Jiwoong Kim, Hee Dong Lee
Estimating the term…
Provided is a polysilicon manufacturing apparatus including a reactor disposed on a base plate to form a reaction chamber, a pair of electrical feedthroughs installed on the base plate to be extended to the inside of the reaction chamber, rod filaments installed on the electrical feedthroughs in the reaction chamber and connected to each other by a rod bridge at the upper end to form a silicon rod by chemical vapor deposition of source gas introduced to a gas inlet, and a cooling jacket inserted to a through-hole provided at the upper side of the reactor to be supported to the base plate, connected to a gas outlet formed on the base plate by forming a gas passage discharging the gas after reaction, and introducing and circulating a low-temperature coolant to a coolant passage from the outside of the reactor by forming the coolant passage at the outside of the gas passage to discharge a high-temperature coolant to the outside of the reactor.
A polysilicon manufacturing apparatus, comprising:
Dependencies are inferred from the claim text.