Device of purifying hydrogen fluoride in semiconductor process waste gas

A device of purifying a fluoride in a semiconductor process waste gas, comprising:

• a reaction chamber formed in a waste gas treating tank of semiconductor having at least one guide pipe of the semiconductor process waste gas for guiding and entering the semiconductor process waste gas comprising the fluoride into the reaction chamber;
• and
• a heat pipe disposed in the waste gas treating tank and inserted into the reaction chamber, the heat pipe having an outside end formed at an outside of the waste gas treating tank and an inner end formed in the reaction chamber, a water injection pipe being disposed at the outside end, a plurality of spit-outs being disposed and formed at the inner end and passing through and arranged on a pipe wall of the heat pipe,
• wherein a heating rod is disposed in and passes through the heat pipe, a passage is formed between the heating rod and the heat pipe, the passage is fluidly connected to the water injection pipe and is fluidly connected to the reaction chamber via the plurality of spit-outs, water is guided and enters into the passage by the water injection pipe, the water in the passage contacts with the heating rod to produce a mist gaseous water at a high temperature, the mist gaseous water is guided and enters into the reaction chamber via the plurality of spit-outs to dissolve the fluoride to be reacted into a hydrogen fluoride, and a dissolving, temperature of the mist gaseous water contacting with the fluoride is 370˜1300° C.