Developing apparatus, developing method and storage medium
AssigneeTokyo Electron Limited
InventorsKousuke Yoshihara, Hideharu Kyouda, Koshi Muta, Taro Yamamoto, Yasushi Takiguchi
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AssigneeTokyo Electron Limited
InventorsKousuke Yoshihara, Hideharu Kyouda, Koshi Muta, Taro Yamamoto, Yasushi Takiguchi
Estimating the term…
A developing apparatus includes: a substrate holder that hold a substrate horizontally; a developer nozzle that supplies a developer onto the substrate to form a liquid puddle; a turning flow generation mechanism including a rotary member that rotates about an axis perpendicular to the substrate while the rotary member is being in contact with the liquid puddle thereby to generate a turning flow in the liquid puddle of the developer formed on the substrate; and a moving mechanism for moving the turning flow generation mechanism along a surface of the substrate. The line-width uniformity of a pattern can be improved by forming turning flows in a desired region of the substrate and stirring the developer.
A developing method comprising:
Dependencies are inferred from the claim text.