Method and device for measuring wavefront using light-exit section causing light amount distribution in at least one direction
AssigneeNikon Corporation
InventorsKatsura Otaki, Katsumi Sugisaki, Takashi Gemma
Life of this patent
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AssigneeNikon Corporation
InventorsKatsura Otaki, Katsumi Sugisaki, Takashi Gemma
Estimating the term…
There is provided a wavefront measuring method for obtaining wavefront information of an optical system. The method including: irradiating the optical system with a light beam; allowing the light beam passed via the optical system to come into a diffraction grating having periodicity in a first direction; and obtaining the wavefront information based on an interference fringe formed by light beams generated from the diffraction grating. The diffraction grating including: first portions which allow light to pass therethrough; and second portions which shield light, each of the second portions being provided between two of the first portions. A ratio between a width of one of the first portions in the first direction and a width of one of the second portions in the first direction is changed in the first direction, the one of the first portions and the one of the second portions being adjacent to each other.
A wavefront measuring method for obtaining wavefront information of an optical system to be measured, the method comprising:
A wavefront measuring device configured to obtain wavefront information of an optical system to be measured, the device comprising:
Dependencies are inferred from the claim text.