Individually-tunable heat reflectors in an EPI-growth system

A semiconductor fabrication system, comprising:

• a wafer carrier configured to carry a wafer thereon;
• a radiation source positioned above the wafer carrier, the radiation source being configured to emit thermal radiation;
• a plurality of reflectors positioned above, and aligned with, an edge region of the wafer, the reflectors each having a reflective coating configured to reflect the thermal radiation;
• a plurality of separately-controllable motors each coupled to a respective one of the reflectors, wherein the motors are each configured to cause its respective reflector to rotate in a counterclockwise direction or a clockwise direction so as to redirect the thermal radiation back toward the edge region of the wafer;
• and
• a controller communicatively coupled to the plurality of motors, wherein the controller is configured to control each of the motors separately to cause each motors to rotate independently of other motors;
• wherein:
• the radiation source comprises a plurality of tubular lamps that are positioned above the edge region of the wafer;
• and
• each tubular lamp extends radially toward a point above a center of the wafer.

A method of fabricating a semiconductor device, comprising:

• placing a wafer on a wafer carrier that is disposed under a heat source configured to produce thermal energy, wherein the heat source is disposed below a plurality of individually-tunable reflectors;
• and
• performing an epitaxial growth process on a wafer, wherein the performing the epitaxial growth process comprises:
• generating thermal energy using the heat source;
• and
• rotating the individually-tunable reflectors to reflect the thermal energy generated by the heat source back toward the wafer;
• wherein the generating the thermal energy comprises generating the thermal energy using a circular lamp disposed over an edge region of the wafer as the heat source, or by using a plurality of tubular lamps disposed over the edge region of the wafer as the heat source.