Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators

A method for achieving a pre-determined factor associated with an edge region within a plasma chamber, comprising:

• providing a radio frequency (RF) signal via a first impedance matching circuit to a main electrode within the plasma chamber, wherein the RF signal is generated based on a frequency of operation of a first RF generator;
• providing another RF signal via a second impedance matching circuit to an edge electrode within the plasma chamber, wherein the other RF signal is generated based on the frequency of operation of the first RF generator, wherein the main electrode is a chuck, and the edge electrode is a coupling ring;
• receiving a first measurement of a variable associated with an output of the first impedance matching circuit;
• receiving a second measurement of the variable associated with an output of the second impedance matching circuit;
• modifying a phase of the other RF signal based on the first measurement and the second measurement;
• and
• changing a magnitude of a variable associated with a second RF generator to achieve the pre-determined factor.

A method for achieving a pre-determined factor associated with an edge region within a plasma chamber, comprising:

• providing a radio frequency (RF) signal via a first impedance matching circuit to a main electrode within the plasma chamber, wherein the RF signal is generated based on a frequency of operation of a first RF generator;
• providing another RF signal via a second impedance matching circuit to an edge electrode within the plasma chamber, wherein the other RF signal is generated based on the frequency of operation of the first RF generator, wherein the main electrode is a chuck, and the edge electrode is an edge ring;
• receiving a first measurement of a variable associated with an output of the first impedance matching circuit;
• receiving a second measurement of the variable associated with an output of the second impedance matching circuit;
• modifying a phase of the other RF signal based on the first measurement and the second measurement;
• and
• changing a magnitude of a variable associated with a second RF generator to achieve the pre-determined factor.