Acid generator compounds and photoresists comprising same
AssigneeRohm and Haas Electronic Materials LLC
InventorPaul J. LaBeaume
Life of this patent
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Abstract
Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, cyclic sulfonium salt and photoresist compositions that comprise such compounds are provided. In another preferred aspect, acid generator compounds are provided that comprise one or more covalently linked acid-labile moieties, particularly ester-containing acid-labile moieties.
Claims25
A photoresist composition, comprising:
- (i) a polymer;
- and
- (ii) an acid generator that corresponds to the following Formula (I):
- wherein R1 corresponds to the formula —(CH2)n′(C═O)O—ALG, n′ is a positive integer and ALG is a group that results in an acid labile moiety;
- A is a hydrogen or non-hydrogen substituent;
- e is an integer from 0 to 4;
- R2 and R3 are the same or different non-hydrogen substitutents, and R2 and R3 may be taken together to form an aromatic or non-aromatic ring;
- and
- Z is a counter anion.
A photoresist composition, comprising:
- (i) a polymer;
- and
- (ii) an acid generator that corresponds to the following Formula (II):
- wherein in Formula II R1 corresponds to the formula —(CH2)n′(C═O)O—ALG, n′ is a positive integer and ALG is a group that results in an acid labile moiety;
- A, B and C are each independently a hydrogen or non-hydrogen substituent;
- D is a single bond;
- >C═O;
- >S(O);
- >S(O)2;
- —C(═O)O—;
- —C(═O)NH—;
- —C(═O)—C(═O)—;
- —O—;
- CHOH;
- CH2;
- or S;
- e, f and g are each independently an integer from 0 to 4;
- and Z− is a counter anion.
A photoresist composition, comprising:
- (i) a polymer;
- and
- (ii) an acid generator that corresponds to the following Formula (III):
- wherein R1 1) provides an acid-labile moiety and 2) comprises an ester linkage;
- X and Y are independently hydrogen or a non-hydrogen substituent;
- A is a hydrogen or non-hydrogen substituent;
- R2 and R3 are the same or different non-hydrogen substitutents, and R2 and R3 may be taken together to form an aromatic or non-aromatic ring;
- n is a positive integer;
- e is an integer from 0 to 4;
- and
- Z−is a counter anion.
A photoresist composition, comprising:
- (i) a polymer;
- and
- (ii) an acid generator that corresponds to the following Formula (IV):
- wherein in Formula (IV) R1 is a non-hydrogen substituent that provides an acid-labile moiety;
- X and Y are independently hydrogen or a non-hydrogen substituent;
- A, B and C are each independently a hydrogen or non-hydrogen substituent;
- D is a single bond;
- >C═O;
- >S(O);
- >S(O)2;
- —C(═O)O—;
- —C(═O)NH—;
- —C(═O)—C(═O)—;
- —O—;
- —CH(OH)—;
- —CH2—;
- or —S—;
- n is a positive integer, e, f and g are the same or different integer from 0 to 4;
- and
- Z− is a counter anion.
An acid generator that corresponds to the following Formula (I):
- wherein R1 corresponds to the formula —(CH2)n′(C═O)O—ALG, n′ is a positive integer and ALG is a group that results in an acid labile moiety;
- A is a hydrogen or non-hydrogen substituent;
- e is an integer from 0 to 4;
- R2 and R3 are the same or different non-hydrogen substitutents, and R2 and R3 may be taken together to form an aromatic or non-aromatic ring;
- and
- Z is a counter anion.
A photoresist composition, comprising:
- (i) a polymer;
- and
- (ii) an acid generator that comprises a group selected from the following:
Dependencies are inferred from the claim text.