Deposition system with integrated cooling on a rotating drum

A system of depositing a film on a substrate, comprising:

• at least one metallization source for generating metal atoms,
• at least one reactive source for generating at least one reactive ionic species,
• a pair of inner and outer concentric cylinders, said outer cylinder being fixedly positioned relative to said metallization source and said reactive source and having first and second openings positioned relative to the metallization source and the reactive source to allow entry of metal atoms and the reactive ionic species into a metallization region and a reaction region, respectively, between the two cylinders,
• at least one mount coupled to said inner cylinder for mounting the substrate thereto such that said substrate is in radiative thermal communication with inner surface of the outer cylinder, said inner cylinder being rotatable for moving the substrate between the two regions so as to expose the substrate alternately to said metal atoms and said reactive ion species,
• wherein said outer cylinder comprises at least one cooling channel through which a cooling fluid can flow for maintaining said inner surface of the outer cylinder at a temperature suitable for radiative cooling of the substrate, and
• wherein the inner surface of the outer cylinder exhibits an emissivity coefficient of at least about 0.7.