Method for manufacturing glass substrate, glass substrate, and panel for display

A method for manufacturing a glass substrate for a display, comprising:

• a manufacturing step of manufacturing a glass substrate;
• the glass substrate having a glass surface and a device surface which is opposite to the glass surface and on which a thin-film transistor is to be formed and
• a surface processing step of performing surface processing for forming unevenness on the glass surface,
• wherein in the surface processing step, protruded portions having a height of 1 nm or more from an average line of a roughness curve are dispersedly provided on the glass surface,
• the surface processing is performed such that a protruded portion area ratio is 0.5 to 10%, the protruded portion area ratio being a ratio of an area of the protruded portions with respect to an area of any rectangular region that has a square shape with a side length of 1 μm and occupies a portion of the glass surface, and
• in a case where the rectangular region is equally divided into at least one hundred divided regions having a square shape, the surface processing is performed such that a protruded portion content ratio is 80% or more, the protruded portion content ratio being a ratio of the number of divided regions having the protruded portions with respect to the number of divided regions included in the rectangular region,
• wherein the glass substrate comprises R′2O, the R′ being at least one selected from Li, Na and K,
• wherein the thin-film transistor includes a circuit in which a wiring has a minimum line width of less than 4 μm and a gate insulating film having a film thickness of less than 100 nm.