Method and apparatus for aligning nanowires deposited by an electrospinning process
AssigneeApplied Materials, Inc.
InventorsKurtis Leschkies, Steven Verhaverbeke, Robert Visser
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AssigneeApplied Materials, Inc.
InventorsKurtis Leschkies, Steven Verhaverbeke, Robert Visser
Estimating the term…
Embodiments of the invention generally include apparatus and methods for depositing nanowires in a predetermined pattern during an electrospinning process. An apparatus includes a nozzle for containing and ejecting a deposition material, and a voltage source coupled to the nozzle to eject the deposition material. One or more electric field shaping devices are positioned to shape the electric field adjacent to a substrate to control the trajectory of the ejected deposition material. The electric field shaping device converges an electric field at a point near the surface of the substrate to accurately deposit the deposition material on the substrate in a predetermined pattern. The methods include applying a voltage to a nozzle to eject an electrically-charged deposition material towards a substrate, and shaping one or more electric fields to control the trajectory of the electrically-charged deposition material. The deposition material is then deposited on the substrate in a predetermined pattern.
An apparatus for electrospinning a material on a substrate, comprising:
An apparatus for electrospinning a material on a substrate, comprising:
Dependencies are inferred from the claim text.