Semiconductor device including an ESD protective element
AssigneeKabushiki Kaisha Toshiba
InventorsToshiki Seshita, Yasuhiko Kuriyama
Life of this patent
Estimating the term…
Loading patent…
AssigneeKabushiki Kaisha Toshiba
InventorsToshiki Seshita, Yasuhiko Kuriyama
Estimating the term…
A semiconductor device formed on a silicon on insulator substrate includes an input node to receive a first signal, such as a high frequency signal, and an output node to output a second signal corresponding to the first signal. A first transistor has a gate that receives the first signal from the input node and thereby outputs an amplified first signal. A second transistor is connected between a drain of the first transistor and the output node. An inductor is connected between a source of the first transistor and a ground potential. A capacitor connected is between the gate of the first transistor and the input node. An electrostatic discharge (ESD) protective element is connected between a first node and a second node. The first node is between the inductor and the first transistor, and the second node is between the input node and the capacitor.
A semiconductor device on a silicon-on-insulator substrate, comprising:
A semiconductor device, comprising:
A low-noise amplifier device on a silicon-on-insulator substrate, comprising:
Dependencies are inferred from the claim text.