Magnetic sensor and method of fabricating the same
AssigneeMagnaChip Semiconductor, Ltd.
InventorsKwan Soo Kim, Dong Joon Kim, Seung Han Ryu, Hee Baeg An, Jong Yeul Jeong, Kyung Soo Kim, Kang Sup Shin
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Abstract
Provided are a magnetic sensor and a method of fabricating the same. The magnetic sensor includes: hall elements disposed in a substrate, a protection layer disposed on the substrate, a seed layer disposed on the protection layer, and an integrated magnetic concentrator (IMC) formed on the seed layer, the seed layer and the IMC each having an uneven surface.
Claims22
A method of fabricating a magnetic sensor, the method comprising:
- forming hall elements;
- forming a protection layer comprising a thin portion having a first thickness and comprising a thick portion having a second thickness that forms a protrusion that protrudes upward from an upper surface of the protection layer;
- forming a seed layer disposed above the hall elements;
- and
- forming an integrated magnetic concentrator (IMC) disposed above the hall elements and the seed layer, the IMC comprising an elevated portion protruding upward from an upper surface of the IMC, and the elevated portion overlapping with the protrusion of the protection layer.
A method of fabricating a magnetic sensor, the method comprising:
- a protection layer above a substrate in which hall elements are disposed;
- forming a buffer layer above the protection layer comprising thin portions having first thicknesses and comprising thick portions having second thicknesses that are thicker than the thin portions that form
- protrusions above a top surface of the buffer layer;
- forming a seed layer having an uneven surface corresponding to the protrusions with an elevated portion that protrudes from an upper surface of the seed layer in a substantially normal direction to an upper surface of the substrate;
- and
- forming an integrated magnetic concentrator (IMC) having an uneven surface above the seed layer and comprising an elevated portion that protrudes from an upper surface of the IMC in the direction substantially normal to the upper surface of the substrate.
A method of fabricating a magnetic sensor, the method comprising:
- forming hall elements;
- forming a seed layer disposed above the hall elements;
- and
- forming an integrated magnetic concentrator (IMC) disposed above the hall elements, the IMC comprising an elevated portion protruding upward from an upper surface of the IMC,
- wherein the hall elements are disposed such that a peripheral edge of the IMC overlaps with a width of the hall elements, and
- wherein the seed layer overlaps the hall elements.
Dependencies are inferred from the claim text.