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US 10,256,077 B2Granted
Sub-pulsing during a state
AssigneeLam Research Corporation
InventorsJohn C. Valcore, Jr., Harmeet Singh, Bradford J. Lyndaker
Life of this patent
Estimating the term…
Abstract
A method for achieving sub-pulsing during a state is described. The method includes receiving a clock signal from a clock source, the clock signal having two states and generating a pulsed signal from the clock signal. The pulsed signal has sub-states within one of the states. The sub-states alternate with respect to each other at a frequency greater than a frequency of the states. The method includes providing the pulsed signal to control power of a radio frequency (RF) signal that is generated by an RF generator. The power is controlled to be synchronous with the pulsed signal.
Claims32
A controller comprising:
- a processor configured to generate a pulsed signal based on information regarding the pulsed signal, the pulsed signal having sub-states within a first state and having sub-states within a second state, the sub-states of the first state alternating with respect to each other at a frequency greater than a frequency of the first and second states and the sub-states of the second state alternating with respect to each other at a frequency greater than the frequency of the first and second states;
- wherein the processor is configured to provide the pulsed signal to control power of a radio frequency (RF) signal generated by a radio frequency (RF) supply, wherein the power of the RF signal is controlled to be synchronous with the pulsed signal and to have the sub-states of the first state and the sub-states of the second state;
- and
- a memory device coupled to the processor.
1 more element
A plasma tool comprising:
- a radio frequency (RF) power supply configured to generate an RF signal;
- a match coupled to the RF power supply to receive the RF signal and generate a modified signal from the RF signal;
- a plasma chamber coupled to the match to receive the modified signal;
- and
- a controller coupled to the RF power supply,
- wherein the controller is configured to generate a pulsed signal based on information regarding the pulsed signal, the pulsed signal having sub-states within a first state and having sub-states within a second state, the sub-states of the first state alternating with respect to each other at a frequency greater than a frequency of the first and second states and the sub-states of the second state alternating with respect to each other at a frequency greater than the frequency of the first and second states;
- wherein the controller is configured to provide the pulsed signal to control power of the RF signal, wherein the power of the RF signal is controlled to be synchronous with the pulsed signal and to have the sub-states of the first state and the sub-states of the second state.
4 more elements
A controller comprising:
- a processor configured to generate a pulsed signal, the pulsed signal having sub-states within a first state and having sub-states within a second state, the sub-states of the first state alternating with respect to each other at a frequency greater than a frequency of the first and second states and the sub-states of the second state alternating with respect to each other at a frequency greater than the frequency of the first and second states;
- wherein the processor is configured to provide the pulsed signal to control power of a radio frequency (RF) signal generated by a radio frequency (RF) generator, wherein the power of the RF signal is controlled to be synchronous with the pulsed signal and to have the sub-states of the first state and the sub-states of the second state;
- and
- a memory device coupled to the processor.
1 more element
A plasma tool comprising:
- a radio frequency (RF) generator configured to generate an RF signal;
- a match coupled to the RF power supply to receive the RF signal and generate a modified signal from the RF signal;
- a plasma chamber coupled to the match to receive the modified signal;
- and
- a controller coupled to the RF generator,
- wherein the controller is configured to generate a pulsed signal, the pulsed signal having sub-states within a first state and having sub-states within a second state, the sub-states of the first state alternating with respect to each other at a frequency greater than a frequency of the first and second states and the sub-states of the second state alternating with respect to each other at a frequency greater than the frequency of the first and second states;
- wherein the controller is configured to provide the pulsed signal to control power of the RF signal generated by the RF generator, wherein the power of the RF signal is controlled to be synchronous with the pulsed signal and to have the sub-states of the first state and the sub-states of the second state.
4 more elements
Dependencies are inferred from the claim text.