Charged particle beam writing method

A charged particle beam writing method for writing a pattern on a substrate by irradiating the substrate with a charged particle beam, the substrate being placed on a movable stage and coated with resist, the method comprising:

• writing a first evaluation pattern in a writing area located in central part of a first substrate having Charge Dissipation Layer (CDL) on resist while stopping the stage to calculate, based on a position of the written first evaluation pattern, a first correction coefficient for correcting a positional error;
• correcting a writing position in a writing area located in central part of a second substrate having no CDL on resist using the first correction coefficient and writing a second evaluation pattern in the writing area of the second substrate while stopping the stage to calculate, based on a position of the written second evaluation pattern, a second correction coefficient for correcting a positional error;
• correcting a writing position in a writing area located in central part of a third substrate having CDL on resist using the first correction coefficient and writing a third evaluation pattern in the writing area of the third substrate while moving the stage to calculate, based on a position of the written third evaluation pattern, a third correction coefficient for correcting a positional error;
• correcting a writing position in a writing area larger than central part of a fourth substrate having CDL on resist using the first correction coefficient and writing a fourth evaluation pattern in the writing area of the fourth substrate while stopping the stage to calculate, based on a position of the written fourth evaluation pattern, a fourth correction coefficient for correcting a positional error;
• and
• computing a corrected position, at which positional deviation of the charged particle beam is corrected, on a surface of the substrate using the first, second, third, and fourth correction coefficients and irradiating the corrected position with the charged particle beam to write a predetermined pattern.