Charged particle beam apparatus
AssigneeHitachi, Ltd.
InventorsMomoyo Enyama, Yasuhiro Shirasaki, Natsuki Tsuno
Life of this patent
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Abstract
A charged particle beam apparatus includes a charged particle source, a separator, a charged particle beam irradiation switch, and a control device. The separator is inserted into a charged particle optical system and deflects a traveling direction of a charged particle beam out of an optical axis of the charged particle optical system or deflects the traveling direction in the optical axis of the charged particle optical system. The charged particle beam irradiation switch absorbs the charged particle beam deflected out of the optical axis of the charged particle optical system or reflects the charged particle beam toward the separator. The control device controls a charged particle beam irradiation switch.
Claims14
A charged particle beam apparatus, comprising:
- a charged particle source;
- a stage on which a sample is placed;
- a charged particle optical system configured to irradiate the sample with a charged particle beam generated in the charged particle source;
- a separator which is inserted in the charged particle optical system and deflects a traveling direction of the charged particle beam out of an optical axis of the charged particle optical system or deflects the traveling direction in the optical axis of the charged particle optical system;
- a charged particle beam irradiation switch configured to absorb the charged particle beam deflected out of the optical axis of the charged particle optical system or reflect the charged particle beam toward the separator, and
- a control device configured to control the charged particle beam irradiation switch.
A charged particle beam apparatus, comprising:
- a charged particle source;
- and
- a charged particle beam reflection control electrode configured to absorb and reflect charged particle beam from the charged particle source by switching an applied voltage and configured to switch irradiation of the charged particle beam on the sample.
Dependencies are inferred from the claim text.