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US 10,256,005 B2Granted
Rotating substrate laser anneal
AssigneeApplied Materials, Inc.
InventorsJoseph M. Ranish, Shashank Sharma, Diwakar N. Kedlaya, Aaron Muir Hunter
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AssigneeApplied Materials, Inc.
InventorsJoseph M. Ranish, Shashank Sharma, Diwakar N. Kedlaya, Aaron Muir Hunter
Estimating the term…
Embodiments of the present disclosure relate to thermal processing of substrates. More specifically, embodiments described herein relate to flash on spike annealing processes and apparatus suitable for performing such processes. In one embodiment, a thermal processing apparatus may include a lamp radiation source, a laser source, and a reflector plate disposed between the lamp radiation source and the laser source. One or more apertures may be formed in the reflector plate and the laser source may be positioned adjacent to the reflector plate such that a laser beam emitted from the laser source propagates through the one or more apertures. In one embodiment, the reflector plate may be substantially circular and the one or more apertures may approximate a sector of the reflector plate.
An apparatus for processing a substrate, comprising:
An apparatus for processing a substrate, comprising:
An apparatus for processing a substrate, comprising:
Dependencies are inferred from the claim text.