Exposure apparatus and method for exposure of transparent substrate

A method for exposure of a transparent substrate, comprising:

• providing an exposure apparatus, wherein the exposure apparatus comprises a carrying device and an ultraviolet (UV) light generation device, the carrying device comprising a base, a linear electric machine, an exposure table, and a pneumatic lift device, the pneumatic lift device being arranged between the exposure table and the base, the pneumatic lift device supporting the exposure table on the base, wherein the pneumatic lift device comprises a main body and a first air bladder and a second air bladder respectively coupled to two opposite sides of the main body, the first air bladder being positioned on the base, the second air bladder abutting and supporting the exposure table, the main body being operable to control inflation or deflection of each of the first air bladder and the second air bladder, the linear electric machine comprising a stator fixed to the base, the linear electric machine comprising a rotor fixedly coupled to the exposure table;
• positioning a transparent substrate having a surface coated with a photosensitive material on the exposure table;
• inflating or deflating the pneumatic lift device to adjust a height of the exposure table;
• and
• positioning a mask between the transparent substrate and the UV light generation device such that UV light emitting from the UV light generation device is allowed to irradiate the photosensitive material, wherein the linear electric machine is operable to drive the transparent substrate to move relative to the UV light.