# US 10,246,412 B2 · Chemical film on substrate and method of forming the same, method of forming paracyclophane containing functional ground with disulfide bond

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- Number: US 10,246,412 B2
- Document ID: US10246412B2
- Status: Granted
- Kind: B2
- Application number: 15/185,003
- Filed: 2016-06-16
- Published: 2017-06-15
- Granted: 2019-04-02
- Earliest claimed: 2015-12-10
- Assignees: May-Hwa Enterprise Corporation
- Applicants: May-Hwa Enterprise Corporation
- Inventors: Hsien-Yeh Chen; Zhen-Yu Guan; Chih-Yu Wu
- Web page: https://patentgrep.com/patent/US10246412B2

## CPC

- C07C 319/22: of hydropolysulfides or polysulfides
- C07C 17/16: of hydroxyl groups
- C07C 22/04: containing six-membered aromatic rings
- C07C 29/14: of a —CHO group
- C07C 45/30: with halogen containing compounds, e.g. hypohalogenation
- C07C 45/45: by condensation
- C07C 209/08: with formation of amino groups bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
- C09D 165/04: Polyxylylenes
- C07C 2603/92: with a condensed ring system consisting of at least two mutually uncondensed aromatic ring systems, linked by an annular structure formed by carbon chains on non-adjacent positions of the aromatic system, e.g. cyclophanes
- C08G 2261/1426: containing carboxy groups (COOH) and/or -C(=O)O-moieties
- C08G 2261/1432: containing amide groups
- C08G 2261/145: Side-chains containing sulfur
- C08G 2261/3424: non-conjugated, e.g. paracyclophanes or xylenes
- C07C: ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C09D: COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics A61K; processes for applying liquids or other fluent materials to surfaces, in general, B05D; staining wood B27K5/02; glazes or vitreous enamels C03C; natural resins, French polish, drying-oils, driers, turpentine, per se, C09F; polishing compositions other than French polish, ski waxes C09G; adhesives or use of materials as adhesives C09J; materials for sealing or packing joints or covers C09K3/10; materials for stopping leaks C09K3/12; processes for the electrolytic or electrophoretic production of coatings C25D)
- C08G: MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS

## Abstract

The present invention provides a method of forming paracyclyophane containing disulfide functional group. The paracyclophane is prepared by adding 3,3′-dithiodipropionic acid (DPDPA) and N-ethyl-N′-(3-(dimethylamino)propyl)carbodiimide (EDC) into 4-aminomethyl [2,2] paracyclophane. The present invention further provides a chemical film and a method of forming the same. The chemical film contains poly-p-xylylene with disulfide functional group and is formed on a substrate by a chemical vapor deposition process.

## Claims

### Claim 1

A method of forming a chemical film comprising:
providing a substrate;
performing a chemical vapor deposition (CVD) process to form a chemical film on the substrate, wherein the chemical film comprises poly-p-xylylene with disulfide functional group, wherein monomer of the poly-p-xylylene is formed by adding 3,3′-dithiodipropionic acid and N-ethyl-N′-(3-(dimethylamino)propyl)carbodiimide into 4-aminomethyl [2,2] paracyclophane, thereby obtaining a paracyclophane comprising a disulfide functional group.

### Claim 2 (depends on 1)

The method of forming a chemical film according to claim 1, wherein the chemical vapor deposition process is conducted at a temperature of 500 to 800° C.

### Claim 3 (depends on 1)

The method of forming a chemical film according to claim 1, further comprising:
performing a first thiol-disulfide interaction to make a first thiol molecule connect to the chemical film.

### Claim 4 (depends on 3)

The method of forming a chemical film according to claim 3, further comprising:
after the first thiol-disulfide interaction, performing a second thiol-disulfide interaction to replace the first thiol molecule by a second thiol molecule.

### Claim 5 (depends on 4)

The method of forming a chemical film according to claim 4, wherein the first thiol molecule is different from the second thiol molecule.