# US 10,245,616 B2 · Gas flow device for a system for the radiation treatment of substrates

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- Number: US 10,245,616 B2
- Document ID: US10245616B2
- Status: Granted
- Kind: B2
- Application number: 15/023,611
- Filed: 2014-09-05
- Published: 2016-07-28
- Granted: 2019-04-02
- Earliest claimed: 2013-09-20
- Assignees: Oerlikon Surface Solutions AG, PfäFfikon
- Applicants: Oerlikon Surface Solutions AG, Pfäffikon
- Inventors: Carlos Ribeiro
- Web page: https://patentgrep.com/patent/US10245616B2

## CPC

- B05D 3/06: by exposure to radiation (B05D3/02 takes precedence {; plasma treatment B05D3/141})
- B05C 21/00: Accessories or implements for use in connection with applying liquids or other fluent materials to surfaces, not provided for in groups B05C1/00 - B05C19/00 (accessories or implements for use in connection with painting or artistic drawing and fully provided for in B44D3/02 - B44D3/38, see subgroups of B44D3/00)
- B29B 13/06: by drying (B29B13/08 takes precedence {; drying moulded articles or half products B29C37/0092})
- B29C 35/0805: {using electromagnetic radiation}
- B29C 37/0092: {Drying moulded articles or half products, e.g. preforms, during or after moulding or cooling}
- B29C 71/04: by wave energy or particle radiation {, e.g. for curing or vulcanising preformed articles (during moulding, e.g. in a mould B29C35/08)}
- F26B 3/30: from infrared-emitting elements {(by radiation emanating from passages containing heated fluids other than combustion gases F26B23/10)}
- B29C 35/045: {using gas or flames}
- B29C 2035/0822: {using IR radiation}
- B29C 2035/0827: {using UV radiation}
- B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02)
- B05C: APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (spraying apparatus, atomising apparatus, nozzles B05B; plant for applying liquids or other fluent materials to objects by electrostatic spraying B05B5/08)
- B29B: PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
- B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00)
- F26B: DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM (drying devices for combines A01D41/133; racks for drying fruit or vegetables A01F25/12; drying foodstuffs A23; drying hair A45D20/00; body-drying implements A47K10/00; drying household articles A47L; drying gases or vapours B01D; chemical or physical processes for dewatering or like separating liquids from solids B01D43/00; centrifugal apparatus B04; drying ceramics C04B33/30; drying yarns or fabrics in association with some other form of treatment D06C; drying frames for laundry without heating or positive air circulation, domestic laundry-or spin-driers, wringing or hot pressing laundry D06F; furnaces, kilns, ovens F27)

## Abstract

A system for the radiation treatment of substrates, which includes at least one radiation source above the substrate holders in a chamber, which holders are to be equipped with substrates that are to be treated, and the chamber has means for maintaining a gas flow in the chamber, having at least one gas inlet and at least one gas outlet, characterized in that the at least one gas inlet is situated in the vicinity of the substrate holders so that gas flowing in by means of the at least one gas inlet first flows around the substrate holders before either exiting the chamber directly via the gas outlet or exiting after flowing around the at least one radiation source.

## Claims

### Claim 1

A system for the radiation treatment of substrates, comprising:
at least one radiation source positioned above substrate holders in a chamber, which holders are to be equipped with substrates that are to be treated, and the chamber maintains a gas flow that is built up in the chamber and flows past the substrates after entering the chamber, and the gas flow does not previously flow past the at least one radiation source, the chamber having at least one gas inlet and at least one gas outlet, wherein the gas inlet and gas outlet include elements that have flow conduits that become narrower in a flow direction and then widen out again toward a downstream end, as a result of which during operation of the system, a laminar flow prevails and therefore deposits due to turbulence phenomena do not occur, and wherein the gas inlet and the gas outlet have lugs in an upper part, which hold two respective gas inlet and/or gas outlet devices together to maintain the laminar flow in a region in the upper part as well.

### Claim 2 (depends on 1)

The system according to claim 1, wherein the elements that constitute the flow conduits are formed out of deformable plates that are composed of sheet metal.

### Claim 3 (depends on 2)

The system according to claim 2, wherein at least two of the elements constituting the flow conduits are held together in an upper region by rails, clamps, and/or caps, which enables assembly or disassembly.

### Claim 4 (depends on 3)

The system according to claim 3, wherein the elements constituting the flow conduits are at least double-walled and the at least two walls are spaced apart from each other, thus forming a thermally insulating gap.