Method, system, and user interface for metrology target characterization

A metrology system comprising:

• an overlay metrology tool, wherein the overlay metrology tool acquires a plurality of overlay metrology target signals from a set of targets on a wafer, wherein the overlay metrology tool acquires at least some of the plurality of overlay metrology target signals from different target elements of a single target of the set of targets;
• and
• a processor, wherein the processor is configured to execute a target characterization module, wherein the target characterization module is configured for:
• calculating a plurality of metrics for the acquired plurality of overlay metrology target signals;
• analyzing the calculated plurality of metrics to determine one or more features of at least one target of the set of targets;
• clustering two or more targets of the set of targets according to the calculated plurality of metrics;
• analyzing the clustered two or more targets of the set of targets to identify one or more production errors on the wafer;
• and
• configuring the overlay metrology tool based on the identified one or more production errors to improve measurement accuracy during one or more metrology processes.