Light source arrangement for a photolithography exposure system and photolithography exposure system
AssigneeSuss Microtec Lithography GmbH
InventorPaul Kaiser
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Abstract
A light source arrangement for a photolithography exposure system comprises at least three light sources with different wavelengths, and a beam splitting unit comprising at least three inputs, one output, and at least two reflecting faces. An input is assigned to each light source and each reflecting face. The reflecting face reflects light that is emitted from the light source assigned to a corresponding input thereof into the output. The three light sources are arranged on three different sides around the beam splitting unit.
Claims16
A light source arrangement for a photolithography exposure system having at least three light sources of different wavelengths and a beam splitting unit comprising at least three inputs, an output, and at least two reflecting faces, wherein an input is assigned to each light source and to each reflecting face, wherein the reflecting face reflects light emitted from the light source assigned to the corresponding input thereof, into the output, and wherein the three light sources are arranged on three different sides around the beam splitting unit.
A photolithography exposure system comprising a light source arrangement having at least three light sources of different wavelengths and a beam splitting unit comprising at least three inputs, an output, and at least two reflecting faces, wherein an input is assigned to each light source and to each reflecting face, wherein the reflecting face reflects light emitted from the light source assigned to the corresponding input thereof, into the output, and wherein the three light sources are arranged on three different sides around the beam splitting unit.
A light source arrangement for a photolithography exposure system having at least three light sources of different wavelengths and a beam splitting unit comprising at least three inputs, an output, and at least two reflecting faces, wherein an input is assigned to each light source and to each reflecting face, wherein the reflecting face reflects light emitted from the light source assigned to the corresponding input thereof, into the output, wherein the three light sources are arranged on three different sides around the beam splitting unit, and all the light sources emit light with a wavelength smaller than 500 nm, in particular a wavelength smaller than 450 nm.
Dependencies are inferred from the claim text.