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US 10,241,411 B2Granted
Topcoat compositions containing fluorinated thermal acid generators
AssigneeRohm and Haas Electronic Materials LLC
InventorsIrvinder Kaur, Doris Kang, Cong Liu, Gerhard Pohlers, Mingqi Li
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Abstract
Provided are topcoat compositions that include: a matrix polymer; a surface active polymer; an ionic thermal acid generator comprising an anion and a cation, wherein the anion, the cation, or the anion and the cation are fluorinated; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions. The invention has particular applicability in photolithographic processes as a photoresist topcoat layer in the manufacture of semiconductor devices.
Claims20
A topcoat composition, comprising:
- a matrix polymer;
- a surface active polymer;
- an ionic thermal acid generator comprising an anion and a cation, wherein the anion, the cation, or the anion and the cation are fluorinated;
- and
- a solvent.
2 more elements
Dependencies are inferred from the claim text.