Photosensitive resin composition, resist laminate, and cured product thereof (1)
AssigneeNippon Kayaku Kabushiki Kaisha
InventorsNaoko Imaizumi, Shinya Inagaki, Nao Honda
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AssigneeNippon Kayaku Kabushiki Kaisha
InventorsNaoko Imaizumi, Shinya Inagaki, Nao Honda
Estimating the term…
The purpose of the present invention is to provide: a photosensitive epoxy resin composition and/or a resist laminate of said resin composition that makes it possible to use photolithography to form an image having a vertical sidewall shape and fine resolution, low stress, and heat/humidity resistance; and a cured product of said resin composition and said resist laminate. The present invention is a photosensitive resin composition comprising: (A) an epoxy resin; (B) a polyol compound having a specific structure; (C) a photocationic polymerization initiator; and (D) an epoxy group-containing silane compound. The epoxy resin (A) comprises: an epoxy resin (a) obtained by reacting a phenol derivative that is represented by formula (1) with an epihalohydrin; and an epoxy resin (b) that is represented by formula (2).
A photosensitive resin composition comprising:
Dependencies are inferred from the claim text.