Laser pulse delay system and laser annealing system
AssigneeBoe Technology Group Co., Ltd.
InventorsXiaowei Xu, Xiaolong Li, Liangjian Li
Life of this patent
Estimating the term…
Abstract
The present disclosure discloses a laser pulse delay system and a laser annealing system. The laser pulse delay system comprises: a beam splitter, a first reflective unit and a delay unit. The beam splitter is configured to split a laser beam emitted by a laser into a first beam and a second beam, such that the first beam is transmitted to the first reflective unit and the second beam is transmitted to the delay unit. The first reflective unit is configured to reflect the first beam it receives, such that the reflected first beam is transmitted to a component to be irradiated. The delay unit is configured to delay the second beam it receives, such that the delayed second beam is transmitted to the component to be irradiated.
Claims20
A laser pulse delay system comprising:
- a beam splitter, a first reflective unit and a delay unit, wherein:
- the beam splitter is configured to split a laser beam emitted by a laser into a first beam and a second beam, such that the first beam is transmitted to the first reflective unit and the second beam is transmitted to the delay unit;
- the first reflective unit is configured to reflect the first beam it receives, such that the reflected first beam is transmitted to a component to be irradiated;
- the delay unit is configured to delay the second beam it receives, such that the delayed second beam is transmitted to the component to be irradiated;
- and
- in one laser pulse cycle, a total pulse duration of laser beams irradiating the component to be irradiated is longer than a pulse duration of laser beams emitted by the laser.
Dependencies are inferred from the claim text.