Thin film total internal reflection diffraction grating for single polarization or dual polarization
AssigneeLumentum Operations LLC
InventorsJohn Michael Miller, Gonzalo Wills, Lu Tian, Michael O'Leary
Life of this patent
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Abstract
A diffraction grating may include a substrate. The diffraction grating may include an etch stop layer to prevent etching of the substrate. The etch stop layer may be deposited on the substrate. The diffraction grating may include a marker layer to indicate an etch end-point associated with etching of a dielectric layer. The marker layer may be deposited on a portion of the etch stop layer. The diffraction grating may include the dielectric layer to form a grating layer after being etched. The dielectric layer may be deposited on at least the marker layer.
Claims20
A diffraction grating, comprising:
- a substrate;
- an etch stop layer to prevent etching of the substrate,
- the etch stop layer being on the substrate;
- a marker layer, comprising an etchable material, that indicates an etch end-point associated with etching of a dielectric layer,
- the marker layer being on a portion of the etch stop layer;
- and
- the dielectric layer that forms a periodic grating layer after being etched,
- the dielectric layer being on at least the marker layer.
A diffraction grating, to operate based on total internal reflection, comprising:
- a substrate;
- an etch stop layer to prevent etching of the substrate,
- the etch stop layer being on the substrate;
- a dielectric grating layer on the etch stop layer,
- the dielectric grating layer being a periodic grating;
- and
- an encapsulation layer to protect the dielectric grating layer,
- the encapsulation layer being on at least the dielectric grating layer, and
- the encapsulation layer comprising a planar surface that spans a width of the dielectric grating layer.
A method of manufacturing a diffraction grating, the method comprising:
- depositing an etch stop layer on a substrate;
- depositing a marker layer on a portion of the etch stop layer;
- depositing a dielectric layer on the marker layer;
- etching the dielectric layer to form a grating layer,
- during etching the dielectric layer,
- preventing, by the etch stop layer, etching of the substrate;
- and
- determining, based on etching the marker layer, that the etching the dielectric layer is to be stopped;
- and
- etching the marker layer to indicate an etch end-point associated with the etching of the dielectric layer.
Dependencies are inferred from the claim text.