Gas distribution apparatus for processing chambers

A processing chamber, comprising:

• a chamber body;
• a substrate support disposed within the chamber body and adapted to support a substrate thereon;
• a plurality of gas inlets positioned above the substrate support to direct a process gas above the substrate support;
• and
• a movable diffuser mounted adjacent to the substrate support, the movable diffuser having a deposition head, an elongated curved section, and an arm process gas flow path leading to a plurality of inlet openings in the movable diffuser for directing process gas toward the substrate support wherein the movable diffuser is rotatable to a plurality of operational positions with the plurality of inlet openings of the movable diffuser being positioned over a different area of the substrate support for each of the plurality of operational positions, and wherein the deposition head of the movable diffuser is movable to a plurality of positions on an arc path between a perimeter of the substrate support and a center of the substrate support.

A processing chamber for processing a substrate, comprising:

• a chamber body including a processing chamber interior having a vacuum port;
• a substrate support disposed within the chamber body and adapted to support the substrate thereon;
• a plurality of gas inlets positioned above the substrate support to direct a process gas above the substrate support;
• and
• a movable diffuser pivotally mounted adjacent to the substrate support via a pivoting mount, the movable diffuser comprising an elongated curved section and a deposition head having a plurality of inlet openings for directing process gas toward the substrate support and a plurality of exhaust openings for providing an exhaust to process gas disposed above the substrate support by the movable diffuser, wherein the deposition head is movable to a plurality of positions on an arc path between a perimeter of the substrate support and a center of the substrate support, wherein the movable diffuser includes an arm exhaust flow path coupled to the plurality of exhaust openings, and wherein the arm exhaust flow path is coupled to the processing chamber interior and the vacuum port.