Block copolymer
AssigneeLG Chem, Ltd.
InventorsJe Gwon Lee, No Jin Park, Jung Keun Kim, Se Jin Ku, Mi Sook Lee, Eun Young Choi, Sung Soo Yoon, Hyung Ju Ryu
Life of this patent
Estimating the term…
Abstract
The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.
Claims21
A block copolymer comprising a first block comprising a unit represented by Structural Formula 1 below and a second block comprising a unit represented by Structural Formula 3 below:
- wherein, R of the Formula 1 represents a hydrogen atom or an alkyl group;
- X of the Formula 1 represents a single bond, an oxygen atom, a sulfur atom, —S(═O)2—, a carbonyl group, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X1— or —X1—C(═O)—, wherein the X1 represents an oxygen atom, a sulfur atom, —S(═O)2—, an alkylene group, an alkenylene group or an alkynylene group;
- Y of the Formula 1 represents a monovalent substituent that includes a ring structure to which a linear chain including 8 or more chain-forming atoms is connected;
- and X2 of the Formula 3 represents a single bond, an oxygen atom, a sulfur atom, —S(═O)2—, an alkylene group, an alkenylene group, an alkynylene group, —C(═O)—X2— or —X2—C(═O)—, wherein the X2 represents a single bond, an oxygen atom, a sulfur atom, —S(═O)2—, an alkylene group, an alkenylene group or an alkynylene group;
- and each of R1 to R5 of the Formula 3 independently represents a hydrogen atom, an alkyl group, a haloalkyl group, a halogen atom or a photo crosslinkable functional group, wherein one or more of the photo crosslinkable functional groups are included in positions marked as R1 to R5.
Dependencies are inferred from the claim text.