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US 10,239,980 B2Granted
Block copolymer
AssigneeLG Chem, Ltd.
InventorsJe Gwon Lee, Jung Keun Kim, No Jin Park, Sung Soo Yoon
Life of this patent
Estimating the term…
Abstract
The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.
Claims23
A block copolymer comprising a first block represented by Formula 4 and a second block comprising an aromatic structure having at least one halogen atom:
- wherein the R is hydrogen or an alkyl group having 1 to 4 carbon atom(s), the X is an oxygen atom, a sulfur atom, S(═O)2, a carbonyl group, an alkenylene group, an alkynylene group, —C(═O)—X1— or —X1—C(═O)—, where the X1 is an oxygen atom, a sulfur atom, —S(═O)2—, an alkylene group, an alkenylene group or an alkynylene group and the Y is a monovalent substituent comprising an aromatic structure to which a chain having 8 or more chain-forming atoms is linked.
A block copolymer comprising a first block represented by Formula 5 and a second block comprising an aromatic structure having at least one halogen atom:
- wherein the R is hydrogen or an alkyl group having 1 to 4 carbon atom(s), the X is —C(═O)—O—, the P is an arylene having 6 to 12 carbon atoms, the Q is an oxygen atom and the Z is a chain having 8 or more chain-forming atoms.
Dependencies are inferred from the claim text.