Method of producing glass substrate and glass substrate
AssigneeAGC Inc.
InventorsHiroshi Hanekawa, Nobutaka Aomine, Yuki Aoshima, Hirotomo Kawahara, Kazunobu Maeshige
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Abstract
A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD includes preparing the glass substrate and forming the first layer on the glass substrate by the low-temperature CVD. In the glass substrate after forming the first layer, an integrated value after a baseline correction in a wavenumber range of 2600 cm−1 to 3800 cm−1 in a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and the C content of the first layer is 1.64 at % or less.
Claims12
A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD, the method comprising:
- preparing the glass substrate;
- and
- forming the first layer on the glass substrate by the low-temperature CVD,
- wherein the first layer is formed on a surface of the glass substrate at a plasma power of 20 kW/m or higher, and
- wherein, in the glass substrate after said forming the first layer, an integrated value after a baseline correction in a wavenumber range of 2600 cm−1 to 3800 cm−1 in a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and a C content of the first layer is 1.64 at % or less.
Dependencies are inferred from the claim text.