Movable support and lithographic apparatus

A lithographic apparatus comprising a movable support configured to support an object, the movable support comprising:

• a support plane to support the object,
• an actuator assembly to move the movable support in a first direction and in a second direction perpendicular to the first direction, wherein the first direction and the second direction extend in a plane parallel to the support plane, the actuator assembly comprising:
• a first actuator configured to exert a first actuation force in a first actuation direction, the first actuation direction being parallel to the support plane,
• a second actuator configured to exert a second actuation force in a second actuation direction, the second actuation direction being parallel to the support plane,
• wherein the first actuation direction and the second actuation direction are arranged non-parallel and non-perpendicular with respect to each other, and
• wherein the movable support is a patterning device support or a substrate support.

A method comprising:

• moving, using an actuator assembly, a movable support supporting an object in a first direction and in a second direction perpendicular to the first direction, wherein the first direction and the second direction extend in a plane parallel to a support plane of the movable support to support the object, wherein the actuator assembly comprises:
• a first actuator configured to exert a first actuation force in a first actuation direction, the first actuation direction being parallel to the support plane, and
• a second actuator configured to exert a second actuation force in a second actuation direction, the second actuation direction being parallel to the support plane,
• wherein the first actuation direction and the second actuation direction are arranged non-parallel and non-perpendicular with respect to each other.