Method for producing surface-modified base material, method for producing joined body, new hydrosilane compound, surface treatment agent, surface treatment agent kit, and surface-modified base material

A new hydrosilane compound, selected from the following compounds:

• 1-(dimethylsilyl)pyrene, 1-(3-dimethylsilylpropyl)naphthalene, (3-azidopropyl)dimethylsilane, [3-(dimethylsilyl)propyl]acrylamide, 1-(3-dimethylsilylpropyl)-3-methylimidazolium iodide, (3-nitropropyl)dimethylsilane, 4-(dimethylsilyl)butyric acid, ethyl 4-(dimethylsilyl)butyrate, [3-(dimethylsilyl)propyl] diethylphosphate, 4-(dimethylsilyl)butanol, (3-benzoylpropyl)dimethylsilane, 5,6-epoxyhexyldimethylsilane, (3-dimethylsilylpropyl)trifluoroacetamide, phthaloylpolymethylhydrosiloxane, chloropropylpolymethylhydrosiloxane, 3-aminopropylpolymethylhydrosiloxane, 3-chloropropyl-isopropoxypolymethylhydrosiloxane, 3-azidopropylpolymethylhydrosiloxane, 3-bromopropylpolymethylhydrosiloxane, octadecylpolymethylhydrosiloxane, perfluorohexylethylpolymethylhydrosiloxane, allylpolymethylhydrosiloxane, chloroisopropoxypolymethylhydrosiloxane, a modified polymethylhydrosiloxane having at least one unit selected from units respectively indicated by the following fomula (a), (b) or (c), a modified polymethylhydrosiloxane having an unit indicated by the following formula (d), a modified polymethylhydrosiloxane having an unit indicated by the following formula (e), N-dimethylhydrosilylpropyliminotriphenylphosphorane, N-methyldihydrosilylpropyliminotriphenylphosphorane, 4-dimethylsilylphenylmagnesium bromide, 4-(1,3-dithian-2-yl)dimethylsilylbenzene, and triethyl-3-(dimethylsilylpropyl)ammonium bromide,

A method for producing a surface-modified base material, comprising a step of bringing a base material having a polar group present on a surface thereof into contact with a hydrosilane compound having a molecular structure A and having a Si—H group composed of a silicon atom of the molecular structure A and a hydrogen atom bonded to the silicon atom in the presence of a borane catalyst so as to allow a dehydrocondensation reaction to take place between the base material and the compound, thereby forming the base material surface-modified with the molecular structure A, wherein

• the hydrosilane compound is a hydrosilane compound selected from the following compounds:
• 1-(dimethylsilyl)pyrene, (dimethyl silyl)ferrocene, 1-(3-dimethylsilylpropyl)naphthalene, (3-azidopropyl)dimethylsilane, [3-(dimethylsilyl)propyl]acrylamide, 1-(3-dimethylsilylpropyl)-3-methylimidazolium iodide, (3-nitropropyl)dimethylsilane, 4-(dimethylsilyl)butyric acid, ethyl 4-(dimethyl silyl)butyrate, [3-(dimethylsilyl)propyl] diethylphosphate, 4-(dimethylsilyl)butanol, (3-benzoylpropyl)dimethylsilane, 5,6-epoxyhexyldimethylsilane, (3-dimethylsilylpropyl)trifluoroacetamide, phthaloylpolymethylhydrosiloxane, chloropropylpolymethylhydrosiloxane, 3-aminopropylpolymethylhydrosiloxane, 3-acetoxypropylpolymethylhydrosiloxane, 3-chloropropyl-isopropoxypolymethylhydrosiloxane, 3-azidopropylpolymethylhydrosiloxane, 3-bromopropylpolymethylhydrosiloxane, dodecylpolymethylhydrosiloxane, octadecylpolymethylhydrosiloxane, perfluorohexylethylpolymethylhydrosiloxane, allylpolymethylhydrosiloxane, 1,2-epoxypropylpolymethylhydrosiloxane, chloroisopropoxypolymethylhydrosiloxane, a modified polymethylhydrosiloxane having at least one unit selected from units respectively indicated by the following fomula (a), (b) or (c), a modified polymethylhydrosiloxane having an unit indicated by the following formula (d), a modified polymethylhydrosiloxane having an unit indicated by the following formula (e), N-dimethylhydrosilylpropyliminotriphenylphosphorane, N-methyldihydrosilylpropyliminotriphenylphosphorane, 4-dimethylsilylphenylmagnesium bromide, 4-(1,3-dithian-2-yl)dimethylsilylbenzene, and triethyl-3-(dimethylsilylpropyl)ammonium bromide,