MEMS device formed by at least two bonded structural layers and manufacturing process thereof
AssigneeSTMicroelectronics S.r.l.
InventorsGiorgio Allegato, Laura Oggioni, Matteo Garavaglia, Roberto Somaschini
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AssigneeSTMicroelectronics S.r.l.
InventorsGiorgio Allegato, Laura Oggioni, Matteo Garavaglia, Roberto Somaschini
Estimating the term…
A microelectromechanical device having a first substrate of semiconductor material and a second substrate of semiconductor material having a bonding recess delimited by projecting portions, monolithic therewith. The bonding recess forms a closed cavity with the first substrate. A bonding structure is arranged within the closed cavity and is bonded to the first and second substrates. A microelectromechanical structure is formed in a substrate chosen between the first and second substrates. The device is manufactured by forming the bonding recess in a first wafer; depositing a bonding mass in the bonding recess, the bonding mass having a greater depth than the bonding recess; and bonding the two wafers.
A microelectromechanical device comprising:
A microelectromechanical device comprising:
A microelectromechanical device comprising:
Dependencies are inferred from the claim text.