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US 10,219,364 B2Granted
Electrostatic microthruster
AssigneeNXP USA, Inc.
InventorAndrew Paul Dickens
Life of this patent
Estimating the term…
Abstract
Embodiments of the present invention provide for movement of a fluid around a small form-factor device, such as a semiconductor device die or package, through use of a microplasma. Embodiments provide for a microplasma generated in an ambient fluid with a lower power than predicted by a Paschen Curve for that fluid. The ionized molecules of the plasma can be manipulated by further generation of an electric field that can be used, for example, to move the ions in a desired direction. The movement of the ionized fluid generates a fluid flow of neighboring, non-ionized fluid molecules in the desired direction.
Claims18
A microplasma generator comprising:
- a substrate comprising a substrate surface;
- a first generation electrode located on the substrate surface;
- and
- a second generation electrode located on the substrate surface, wherein
- one of the first and second generation electrode is configured to be a field emitting electrode when a voltage is applied, and
- a distance between edges of the first generation electrode and the second generation electrode is such that a plasma can be formed in an ambient gas at a predetermined voltage difference between the first generation electrode and the second generation electrode, wherein the ambient gas is in contact with the substrate surface and at a first pressure;
- a first drive electrode located on the substrate surface, wherein the first drive electrode is located closer to the first generation electrode and located external to the region between the first and second generation electrode;
- and
- a second drive electrode located on the substrate surface, wherein
- the second drive electrode is located closer to the second generation electrode and located external to the region between the first and second generation electrodes, and
- the first and second drive electrodes are located such that an electric field formed between the first and second drive electrodes can attract the plasma to one of the first and second drive electrodes.
8 more elements
A method for providing a microplasma generator, the method comprising:
- providing a first generation electrode on a substrate surface;
- providing a second generation electrode on the substrate surface;
- providing an ambient gas at a first pressure in contact with the substrate surface and the first and second generation electrodes;
- applying a predetermined voltage difference between the first generation electrode and the second generation electrode, wherein one of the first and second generation electrode is configured to be a field emitting electrode when a voltage is applied;
- forming a plasma in the ambient gas between the first generation electrode and the second generation electrode, wherein the distance between edges of the first and second generation electrodes is such that the distance multiplied by the first pressure is at or below a minimum of a Paschen curve for the ambient gas at the first pressure for the predetermined voltage;
- providing a first drive electrode formed on the substrate surface, wherein the first drive electrode is closer to the first generation electrode and external to the region between the first and second generation electrodes;
- providing a second drive electrode formed on the substrate surface, wherein
- the second drive electrode is closer to the second generation electrode and external to the region between the first and second generation electrodes;
- and
- applying a voltage difference to the first and second drive electrodes to attract the plasma to one of the first and second drive electrodes.
7 more elements
A microplasma generator comprising:
- a substrate comprising a substrate surface;
- a first generation electrode located on the substrate surface;
- a second generation electrode located on the substrate surface, wherein
- one of the first and second generation electrode is configured to be a field emitting electrode when a voltage is applied, and
- a distance between edges of the first generation electrode and the second generation electrode is such that a plasma can be formed in an ambient gas at a predetermined voltage difference between the first generation electrode and the second generation electrode, wherein the ambient gas is in contact with the substrate surface and at a first pressure;
- a first generation bus located in the substrate and coupled to the first generation electrode;
- and
- a second generation bus located in the substrate and coupled to the second generation electrode, wherein the first and second generation busses are configured to provide the predetermined voltage difference to the first and second generation electrodes.
5 more elements
Dependencies are inferred from the claim text.